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实现条形阻挡层结构的无高性能电子阻挡层深紫外发光二极管。

High-performance electron-blocking-layer-free deep ultraviolet light-emitting diodes implementing a strip-in-a-barrier structure.

作者信息

Velpula Ravi Teja, Jain Barsha, Velpula Swetha, Nguyen Hoang-Duy, Nguyen Hieu Pham Trung

出版信息

Opt Lett. 2020 Sep 15;45(18):5125-5128. doi: 10.1364/OL.400917.

Abstract

In this Letter, the electron-blocking-layer (EBL)-free AlGaN ultraviolet (UV) light-emitting diodes (LEDs) using a strip-in-a-barrier structure have been proposed. The quantum barrier (QB) structures are systematically engineered by integrating a 1 nm intrinsic strip into the middle of QBs. The resulted structures exhibit significantly reduced electron leakage and improved hole injection into the active region, thus generating higher carrier radiative recombination. Our study shows that the proposed structure improves radiative recombination by ∼220, reduces electron leakage by ∼11 times, and enhances optical power by ∼225 at 60 mA current injection compared to a conventional AlGaN EBL LED structure. Moreover, the EBL-free strip-in-a-barrier UV LED records the maximum internal quantum efficiency (IQE) of ∼61.5 which is ∼72 higher, and IQE droop is ∼12.4, which is ∼333 less compared to the conventional AlGaN EBL LED structure at ∼284.5 wavelength. Hence, the proposed EBL-free AlGaN LED is the potential solution to enhance the optical power and produce highly efficient UV emitters.

摘要

在本信函中,我们提出了采用条形嵌入势垒结构的无电子阻挡层(EBL)的AlGaN紫外(UV)发光二极管(LED)。通过将1nm本征条形结构集成到量子势垒(QB)中间,对量子势垒结构进行了系统设计。所得结构显著降低了电子泄漏,并改善了空穴向有源区的注入,从而产生了更高的载流子辐射复合。我们的研究表明,与传统的AlGaN EBL LED结构相比,所提出的结构在60mA电流注入时,将辐射复合提高了约220倍,将电子泄漏降低了约11倍,并将光功率提高了约225倍。此外,无EBL的条形嵌入势垒UV LED在约284.5波长处记录的最大内量子效率(IQE)约为61.5%,比传统AlGaN EBL LED结构高约72%,IQE下降约为12.4%,比传统AlGaN EBL LED结构少约333%。因此,所提出的无EBL的AlGaN LED是提高光功率和生产高效紫外发射器的潜在解决方案。

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