Astrakhan State University, 414056 Astrakhan, Russia; Caspian Institute of Maritime and River Transport, Volga State University of Water Transport, 414014 Astrakhan, Russia; Landau Institute for Theoretical Physics, 142432 Chernogolovka, Russia.
Landau Institute for Theoretical Physics, 142432 Chernogolovka, Russia.
Adv Colloid Interface Sci. 2020 Nov;285:102271. doi: 10.1016/j.cis.2020.102271. Epub 2020 Sep 17.
This review covers experimental results of evaporative lithography and analyzes existing mathematical models of this method. Evaporating droplets and films are used in different fields, such as cooling of heated surfaces of electronic devices, diagnostics in health care, creation of transparent conductive coatings on flexible substrates, and surface patterning. A method called evaporative lithography emerged after the connection between the coffee ring effect taking place in drying colloidal droplets and naturally occurring inhomogeneous vapor flux densities from liquid-vapor interfaces was established. Essential control of the colloidal particle deposit patterns is achieved in this method by producing ambient conditions that induce a nonuniform evaporation profile from the colloidal liquid surface. Evaporative lithography is part of a wider field known as "evaporative-induced self-assembly" (EISA). EISA involves methods based on contact line processes, methods employing particle interaction effects, and evaporative lithography. As a rule, evaporative lithography is a flexible and single-stage process with such advantages as simplicity, low price, and the possibility of application to almost any substrate without pretreatment. Since there is no mechanical impact on the template in evaporative lithography, the template integrity is preserved in the process. The method is also useful for creating materials with localized functions, such as slipperiness and self-healing. For these reasons, evaporative lithography attracts increasing attention and has a number of noticeable achievements at present. We also analyze limitations of the approach and ways of its further development.
本文综述了蒸发光刻的实验结果，并分析了该方法现有的数学模型。蒸发液滴和薄膜在不同领域得到了应用，如电子设备加热表面的冷却、医疗诊断、在柔性衬底上制造透明导电涂层以及表面图案化。蒸发光刻方法是在确定了在干燥胶体液滴中发生的咖啡环效应与液体-蒸汽界面处自然存在的不均匀蒸汽通量密度之间的联系之后出现的。通过在胶体液体表面产生诱导非均匀蒸发轮廓的环境条件，可以实现对胶体颗粒沉积图案的基本控制。蒸发光刻是更广泛的“蒸发诱导自组装”（EISA）领域的一部分。EISA 涉及基于接触线过程的方法、利用颗粒相互作用效应的方法以及蒸发光刻。通常，蒸发光刻是一种灵活的单阶段工艺，具有简单、价格低廉、无需预处理即可应用于几乎任何基底等优点。由于在蒸发光刻中模板不受机械冲击，因此在该过程中保持了模板的完整性。该方法还可用于创建具有局部功能的材料，如滑溜性和自修复性。由于这些原因，蒸发光刻引起了越来越多的关注，并在目前取得了许多显著的成果。我们还分析了该方法的局限性及其进一步发展的途径。
