Department of Materials Science and Engineering and Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA.
Philos Trans A Math Phys Eng Sci. 2009 Dec 28;367(1909):5157-65. doi: 10.1098/rsta.2009.0157.
Evaporative lithography offers a promising new route for patterning a broad array of soft materials. In this approach, a mask is placed above a drying film to create regions of free and hindered evaporation, which drive fluid convection and entrained particles to regions of highest evaporative flux. We show that binary colloidal films exhibit remarkable pattern formation when subjected to a periodic evaporative landscape during drying.
蒸发光刻为图案化各种软材料提供了一条很有前途的新途径。在这种方法中，将掩模放置在干燥膜上方，以形成自由蒸发和受阻蒸发的区域，这会驱动流体对流，并将夹带的颗粒带到蒸发通量最高的区域。我们发现，当二元胶体薄膜在干燥过程中受到周期性蒸发地形的影响时，会发生显著的图案形成。
