Chen Yifan, Hung Siu Fai, Lo Wing Ki, Chen Yang, Shen Yang, Kafenda Kim, Su Jia, Xia Kangwei, Yang Sen
Department of Physics, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong, China.
Department of Biology, South University of Science and Technology of China, Shenzhen, Guangdong, 518058, China.
Nat Commun. 2020 Oct 21;11(1):5334. doi: 10.1038/s41467-020-19210-0.
Current techniques of patterned material deposition require separate steps for patterning and material deposition. The complexity and harsh working conditions post serious limitations for fabrication. Here, we introduce a single-step and easy-to-adapt method that can deposit materials in-situ. Its methodology is based on the semiconductor nanoparticle assisted photon-induced chemical reduction and optical trapping. This universal mechanism can be used for depositing a large selection of materials including metals, insulators and magnets, with quality on par with current technologies. Patterning with several materials together with optical-diffraction-limited resolution and accuracy can be achieved from macroscopic to microscopic scale. Furthermore, the setup is naturally compatible with optical microscopy based measurements, thus sample characterisation and material deposition can be realised in-situ. Various devices fabricated with this method in 2D or 3D show it is ready for deployment in practical applications. This method will provide a distinct tool in material technology.
当前的图案化材料沉积技术需要用于图案化和材料沉积的单独步骤。其复杂性和苛刻的工作条件严重限制了制造过程。在此，我们介绍一种单步且易于适配的方法，该方法可原位沉积材料。其方法基于半导体纳米颗粒辅助的光致化学还原和光镊技术。这种通用机制可用于沉积多种材料，包括金属、绝缘体和磁体，其质量与当前技术相当。通过宏观到微观尺度，可以实现几种材料的图案化，并具有光学衍射极限的分辨率和精度。此外，该装置自然与基于光学显微镜的测量兼容，因此可以原位实现样品表征和材料沉积。用这种方法制造的各种二维或三维器件表明它已准备好在实际应用中部署。这种方法将为材料技术提供一种独特的工具。
