Hai Kuo, Li Longxiang, Hu Haixiang, Zhang Zhiyu, Bai Yang, Luo Xiao, Yi Liqi, Yang Xi, Xue Donglin, Zhang Xuejun
Appl Opt. 2020 Oct 1;59(28):8740-8750. doi: 10.1364/AO.400464.
Magnetorheological jet polishing (MJP) plays an important role in polishing complex cavities and special optical elements with high precision. However, the roughness distribution function that describes the variation with polishing time of the roughness value of every area in the polishing area has not been studied deeply. In this paper, the influence of the roughness distribution on the removal function of MJP in optics (with a roughness of less than 10 nm) and its evolution model in the spatial and time domains are studied. With the increase of polishing time, the surface roughness of the central area linearly increases, forming surface defects, such as pits. The roughness of the polishing area exhibits a limited growth trend. Verification experiments are carried out on BK7 glass. The results of the roughness distribution on the removal function prove the correctness of the model. The model laid a foundation; therefore, it has important guidance and reference value for the application to the whole aperture polishing.
磁流变喷射抛光（MJP）在高精度抛光复杂型腔和特殊光学元件方面发挥着重要作用。然而，描述抛光区域内各区域粗糙度值随抛光时间变化的粗糙度分布函数尚未得到深入研究。本文研究了粗糙度分布对光学领域（粗糙度小于10nm）磁流变喷射抛光去除函数的影响及其在空间和时间域的演化模型。随着抛光时间的增加，中心区域的表面粗糙度呈线性增加，形成诸如凹坑等表面缺陷。抛光区域的粗糙度呈现出有限的增长趋势。在BK7玻璃上进行了验证实验。去除函数上粗糙度分布的结果证明了该模型的正确性。该模型奠定了基础，因此，对于全口径抛光应用具有重要的指导和参考价值。
