Zhang Limin, Li Weixing, Zhou Jiakang, Lu Mingming, Liu Qiang, Du Yongsheng, Yang Yakun
Jilin Provincial International Cooperation Key Laboratory for High-Performance Manufacturing and Testing, School of Mechatronic Engineering, Changchun University of Technology, Changchun 130012, China.
School of Machinery and Automation, Weifang University, Weifang 261061, China.
Micromachines (Basel). 2022 Dec 25;14(1):54. doi: 10.3390/mi14010054.
Compared to conventional polishing methods, magnetorheological polishing has no subsurface damage and a has good polishing effect, which is suitable for fused silica glass surface processing. However, the existing magnetorheological polishing material removal model has low processing efficiency and uneven removal, which cannot realize the deterministic processing of parts. The material removal (MR) model of fused silica glass is established by convolving the dwell time with the material removal function. The residence time is Fourier transformed. The consequence of process variable such as machining time, workpiece rotational frequency, machining gap and X-direction deflection on the MR of workpiece interface are analyzed. Experiments verify the validity of the material removal model. The surface precision PV value of the workpiece surface under the optimal process parameters was decreased from 7.959 nm to 0.609 nm for machining. The experiment results indicate that the established MR model can be implemented as the deterministic MR of the optical surface and ameliorate the surface accuracy of the workpiece surface.
与传统抛光方法相比,磁流变抛光没有亚表面损伤且抛光效果良好,适用于熔融石英玻璃表面加工。然而,现有的磁流变抛光材料去除模型加工效率低且去除不均匀,无法实现零件的确定性加工。通过将驻留时间与材料去除函数进行卷积,建立了熔融石英玻璃的材料去除(MR)模型。对驻留时间进行傅里叶变换。分析了加工时间、工件旋转频率、加工间隙和X方向偏转等工艺变量对工件界面MR的影响。实验验证了材料去除模型的有效性。在最佳工艺参数下,工件表面的表面精度PV值从7.959nm降低到0.609nm用于加工。实验结果表明,所建立的MR模型可实现光学表面的确定性MR,并改善工件表面的表面精度。