Hu Qianqian, Wang Pengfei, Yin Jun, Liu Yu, Lv Bocheng, Zhu Jia-Lin, Dong Zhanmin, Zhang Wei, Ma Wanyun, Sun Jialin
State Key Laboratory of Low-Dimensional Quantum Physics, Department of Physics, Tsinghua University, Beijing 100084, P. R. China.
School of Mechanical Engineering and Automation, Fuzhou University, Fuzhou 350108, P. R. China.
ACS Appl Mater Interfaces. 2020 Nov 11;12(45):50763-50771. doi: 10.1021/acsami.0c17751. Epub 2020 Nov 2.
Graphene has excellent electrical, optical, thermal, and mechanical properties that make it an ideal optoelectronic material. However, it still has some problems, such as a very low light absorption rate, which means it cannot meet the application requirements of high-performance optoelectronic devices. Here, we produce a high-responsivity photodetector based on a monolayer graphene/RbAgI composite nanostructure. With the aid of poly(methyl methacrylate), we suspend the monolayer graphene on a hollow carving groove with a width of 100 μm. A RbAgI film evaporated on the back of the graphene causes the composite nanostructure to generate a large photocurrent under periodic illumination. Experimental results show that the dissociation and recombination of ion-electron bound states (IEBSs) are responsible for the excellent photoresponse. The device has very high (>1 A W) responsivity in wide-band illumination wavelength from 375 nm to 808 nm, especially at 375 nm, where it shows a responsivity of up to ∼5000 A W. We designed the dimensions of the carving groove to allow the light spot to cover the entire groove, and we cut the graphene sheet to match the length of the carving groove. With the structural optimizations, the energy of light can be used more efficiently to dissociate the IEBSs, which greatly improves the photoresponse of optoelectronic devices based on the proposed monolayer graphene/RbAgI composite nanostructure.
石墨烯具有优异的电学、光学、热学和力学性能,使其成为一种理想的光电器件材料。然而,它仍然存在一些问题,比如光吸收率极低,这意味着它无法满足高性能光电器件的应用要求。在此,我们基于单层石墨烯/RbAgI复合纳米结构制备了一种高响应度的光电探测器。借助聚甲基丙烯酸甲酯,我们将单层石墨烯悬浮在宽度为100μm的空心刻槽上。在石墨烯背面蒸发的RbAgI薄膜使复合纳米结构在周期性光照下产生大的光电流。实验结果表明,离子-电子束缚态(IEBSs)的解离和复合是优异光响应的原因。该器件在375nm至808nm的宽带照明波长范围内具有非常高的(>1 A W)响应度,特别是在375nm处,其响应度高达约5000 A W。我们设计了刻槽的尺寸,以使光斑覆盖整个刻槽,并且我们裁剪石墨烯片以匹配刻槽的长度。通过结构优化,光的能量可以更有效地用于解离IEBSs,这极大地提高了基于所提出的单层石墨烯/RbAgI复合纳米结构的光电器件的光响应。