Mazurak Andrzej, Mroczyński Robert, Beke David, Gali Adam
Institute of Microelectronics and Optoelectronics, Warsaw University of Technology, Koszykowa 75, 00-662 Warsaw, Poland.
Wigner Research Centre for Physics, POB. 49, H-1525 Budapest, Hungary.
Nanomaterials (Basel). 2020 Nov 29;10(12):2387. doi: 10.3390/nano10122387.
Colloidal cubic silicon-carbide nanocrystals have been fabricated, characterized, and introduced into metal-insulator-semiconductor and metal-insulator-metal structures based on hafnium oxide layers. The fabricated structures were characterized through the stress-and-sense measurements in terms of device capacitance, flat-band voltage shift, switching characteristics, and retention time. The examined electrical performance of the sample structures has demonstrated the feasibility of the application of both types of structures based on SiC nanoparticles in memory devices.
已制备出胶体立方碳化硅纳米晶体,对其进行了表征,并将其引入基于氧化铪层的金属-绝缘体-半导体和金属-绝缘体-金属结构中。通过应力和传感测量,从器件电容、平带电压偏移、开关特性和保持时间等方面对制备的结构进行了表征。对样品结构的电学性能测试表明,基于碳化硅纳米颗粒的这两种结构应用于存储器件是可行的。