Xing Qiuwei, Wang Haijiang, Chen Mingbiao, Chen Zhaoyun, Li Rongbin, Jin Peipeng, Zhang Yong
State Key Laboratory of Advanced Metals and Materials, University of Science and Technology Beijing, Beijing 100083, China.
School of Mechanical Engineering, Qinghai University, Xining 810016, China.
Entropy (Basel). 2019 Apr 13;21(4):396. doi: 10.3390/e21040396.
In this study, we designed and fabricated NbTiAlSiZrN high-entropy alloy (HEA) films. The parameters of the radio frequency (RF) pulse magnetron sputtering process were fixed to maintain the N flux ratio at 0%, 10%, 20%, 30%, 40%, and 50%. Subsequently, NbTiAlSiZrN HEA films were deposited on the 304 stainless steel (SS) substrate. With an increasing N flow rate, the film deposited at a R of 50% had the highest hardness (12.4 GPa), the highest modulus (169 GPa), a small roughness, and a beautiful color. The thicknesses of the films were gradually reduced from 298.8 nm to 200 nm, and all the thin films were of amorphous structure. The electrochemical corrosion resistance of the film in a 0.5 mol/L HSO solution at room temperature was studied and the characteristics changed. The HEA films prepared at N flow rates of 10% and 30% were more prone to corrosion than 304 SS, but the corrosion rate was lower than that of 304 SS. NbTiAlSiZrN HEA films prepared at N flow rates of 20%, 40%, and 50% were more corrosion-resistant than 304 SS. In addition, the passivation stability of the NbTiAlSiZrN HEA was worse than that of 304 SS. Altogether, these results show that pitting corrosion occurred on NbTiAlSiZrN HEA films.
在本研究中,我们设计并制备了NbTiAlSiZrN高熵合金(HEA)薄膜。固定射频(RF)脉冲磁控溅射工艺参数,以使氮通量比分别保持在0%、10%、20%、30%、40%和50%。随后,在304不锈钢(SS)基底上沉积NbTiAlSiZrN HEA薄膜。随着氮流量的增加,在氮通量比为50%时沉积的薄膜具有最高硬度(12.4 GPa)、最高模量(169 GPa)、较小的粗糙度和漂亮的色泽。薄膜厚度从298.8 nm逐渐减小至200 nm,且所有薄膜均为非晶结构。研究了该薄膜在室温下0.5 mol/L硫酸溶液中的电化学耐蚀性,其特性发生了变化。在氮流量为10%和30%时制备的HEA薄膜比304不锈钢更容易发生腐蚀,但其腐蚀速率低于304不锈钢。在氮流量为20%、40%和50%时制备的NbTiAlSiZrN HEA薄膜比304不锈钢更耐腐蚀。此外,NbTiAlSiZrN HEA的钝化稳定性比304不锈钢差。总之,这些结果表明NbTiAlSiZrN HEA薄膜发生了点蚀。