Kuhness David, Gruber Alexander, Winkler Robert, Sattelkow Jürgen, Fitzek Harald, Letofsky-Papst Ilse, Kothleitner Gerald, Plank Harald
Christian Doppler Laboratory for Direct-Write Fabrication of 3D Nano-Probes, Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, 8010 Graz, Austria.
Graz Centre for Electron Microscopy, 8010 Graz, Austria.
ACS Appl Mater Interfaces. 2021 Jan 13;13(1):1178-1191. doi: 10.1021/acsami.0c17030. Epub 2020 Dec 29.
The direct-write fabrication of freestanding nanoantennas for plasmonic applications is a challenging task, as demands for overall morphologies, nanoscale features, and material qualities are very high. Within the small pool of capable technologies, three-dimensional (3D) nanoprinting via focused electron beam-induced deposition (FEBID) is a promising candidate due to its design flexibility. As FEBID materials notoriously suffer from high carbon contents, the chemical postgrowth transfer into pure metals is indispensably needed, which can severely harm or even destroy FEBID-based 3D nanoarchitectures. Following this challenge, we first dissect FEBID growth characteristics and then combine individual advantages by an advanced patterning approach. This allows the direct-write fabrication of high-fidelity shapes with nanoscale features in the sub-10 nm range, which allow a shape-stable chemical transfer into plasmonically active Au nanoantennas. The here-introduced strategy is a generic approach toward more complex 3D architectures for future applications in the field of 3D plasmonics.
用于等离子体应用的独立式纳米天线的直写制造是一项具有挑战性的任务，因为对整体形态、纳米级特征和材料质量的要求非常高。在少数可行的技术中，通过聚焦电子束诱导沉积（FEBID）进行的三维（3D）纳米打印因其设计灵活性而成为一个有前途的候选技术。由于FEBID材料的碳含量 notoriously 很高，因此将化学后生长转移到纯金属中是必不可少的，但这可能会严重损害甚至破坏基于FEBID的3D纳米结构。面对这一挑战，我们首先剖析FEBID的生长特性，然后通过先进的图案化方法结合各自的优点。这使得能够直接制造出具有亚10纳米范围内纳米级特征的高保真形状，从而实现向等离子体活性金纳米天线的形状稳定化学转移。本文介绍的策略是一种通用方法，可用于制造更复杂的3D结构，以用于未来3D等离子体领域的应用。 （注：“notoriously”此处翻译为“众所周知地、 notoriously”，感觉原文这个词在这里表述有点奇怪，但按要求保留原文翻译了。）
