Larciprete Maria Cristina, Centini Marco, Paoloni Stefano, Dereshgi Sina A, Tang Kechao, Wu Junqiao, Aydin Koray
Opt Express. 2020 Dec 21;28(26):39203-39215. doi: 10.1364/OE.411556.
We experimentally investigate the semiconductor-to-metal transition (SMT) in vanadium dioxide thin films using an infrared thermographic technique. During the semiconductor to metal phase change process, VO optical properties dynamically change and infrared emission undergoes a hysteresis loop due to differences between heating and cooling stages. The shape of the hysteresis loop was accurately monitored under different dynamic heating/cooling rates. In order to quantify and understand the effects of different rates, we used a numerical modelling approach in which a VO thin layer was modeled as metamaterial. The main experimental findings are interpreted assuming that both the rate of formation and shape of metallic inclusions are tuned with the heating/cooling rate. The structural transition from monoclinic to tetragonal phases is the main mechanism for controlling the global properties of the phase transition. However, our experimental results reveal that the dynamics of the heating/cooling process can become a useful parameter for further tuning options and lays out a macroscopic optical sensing scheme for the microscopic phase change dynamics of VO. Our study sheds light on phase-transition dynamics and their effect on the infrared emission spectra of VO thin films, therefore enabling the heating/cooling rate to be an additional parameter to control infrared emission characteristics of thermal emitters. The hysteresis loop represents the phase coexistence region, thus being of fundamental importance for several applications, such as the operation of radiative thermal logic elements based on phase transition materials. For such applications, the phase transition region is shifted for heating and cooling processes. We also show that, depending on the way the phase change elements are heated, the temperature operation range will be slightly modified.
我们使用红外热成像技术对二氧化钒薄膜中的半导体-金属转变(SMT)进行了实验研究。在半导体到金属的相变过程中,VO的光学性质动态变化,并且由于加热和冷却阶段的差异,红外发射呈现出滞后回线。在不同的动态加热/冷却速率下,准确监测了滞后回线的形状。为了量化和理解不同速率的影响,我们采用了一种数值建模方法,其中将VO薄层建模为超材料。主要实验结果的解释是假设金属夹杂物的形成速率和形状都随加热/冷却速率进行调整。从单斜相到四方相的结构转变是控制相变全局性质的主要机制。然而,我们的实验结果表明,加热/冷却过程的动力学可以成为进一步调整选项的有用参数,并为VO的微观相变动力学制定了宏观光学传感方案。我们的研究揭示了相变动力学及其对VO薄膜红外发射光谱的影响,因此使加热/冷却速率成为控制热发射体红外发射特性的一个额外参数。滞后回线代表了相共存区域,因此对于一些应用(如基于相变材料的辐射热逻辑元件的运行)至关重要。对于此类应用,加热和冷却过程中的相变区域会发生偏移。我们还表明,根据相变元件的加热方式,温度工作范围会略有改变。