Nanoscale film thickness measurement based on weak measurement.

In this paper, a novel method of film thickness measurement based on weak measurements is proposed by analyzing the quantitative relationship between film thickness and the weak measurement amplified shift of the photonic spin Hall effect, and the corresponding measurement system is established to verify it through experiments. This method can measure the thickness of an arbitrary dielectric film with nanometer resolution. The theoretical analysis and experimental results show that the method is reasonable, feasible, and reliable, and the structure of the measurement system is simple, easy to operate, and easy to assemble into a prototype instrument. The measurement model and method provide not only a new way for the measurement of thin film thickness but also an important reference for the precise measurement of other optical interface parameters.