Ilin Eduard, Burkova Irina, Colla Eugene V, Pak Michael, Bezryadin Alexey
Department of Physics, University of Illinois at Urbana-Champaign, Urbana, IL 61801, United States of America.
Department of Engineering Physics, Air Force Institute of Technology, Dayton, OH 45433, United States of America.
Nanotechnology. 2021 Apr 9;32(15):155401. doi: 10.1088/1361-6528/abd8f7.
We fabricate nanolayer alumina capacitor and apply high electric fields, close to 1 GV m, to inject charges in the dielectric. Asymmetric charge distributions have been achieved due to the selectivity of the quantum tunneling process. Namely, the electrons near the Fermi level cannot tunnel intoregions near the cathode, where the total energy would be less than the potential energy. This mechanism exhibits a strong tendency to populate charge traps located near the anode, i.e. the regions where their potential energy is the lowest. Such spatially selective charging of the dielectric allows a permanent bulk charge storage in the dielectric layer, even if the capacitor plates are short-circuited, provided that the temperature is sufficiently low so that the conductivity of the dielectric is negligible. The stored charge can be recovered if the temperature is increased above ~250 K for the dielectric tested, i.e. AlO. In our experiments, the total charge stored in the dielectric was up to seven and a half times higher than the charge stored on the capacitor plates. Also, measurements of the breakdown voltage show that the breakdown electric field, i.e. the dielectric strength, is independent of the thickness of the dielectric.
我们制造了纳米层氧化铝电容器,并施加接近1 GV/m的高电场,以便在电介质中注入电荷。由于量子隧穿过程的选择性,实现了不对称的电荷分布。也就是说,费米能级附近的电子无法隧穿到阴极附近总能量低于势能的区域。这种机制表现出强烈的倾向,使电荷陷阱聚集在阳极附近,即势能最低的区域。即使电容器极板短路,只要温度足够低,使得电介质的电导率可忽略不计,这种电介质的空间选择性充电就能使电荷永久存储在电介质层中。对于所测试的电介质(即AlO),如果温度升高到约250 K以上,存储的电荷可以恢复。在我们的实验中,电介质中存储的总电荷量比电容器极板上存储的电荷量高出多达7.5倍。此外,击穿电压的测量表明,击穿电场,即介电强度,与电介质的厚度无关。