特刊社论：通过物理气相沉积法合成纳米结构表面和薄膜
Editorial for Special Issue: Nanostructured Surfaces and Thin Films Synthesis by Physical Vapor Deposition.
作者信息
Palmero Alberto, Alcala German, Alvarez Rafael
机构信息
Materials Science Institute of Seville (CSIC-US), Américo Vespucio 49, 41092 Seville, Spain.
Departamento Ingeniería Química y Materiales, Universidad Complutense de Madrid, Avenida Complutense s/n, Facultad de Ciencias Químicas, 28040 Madrid, Spain.
出版信息
Nanomaterials (Basel). 2021 Jan 9;11(1):148. doi: 10.3390/nano11010148.
Abstract
The scientific interest in the growth of nanostructured surfaces and thin films by means of physical vapor deposition (PVD) techniques has undoubtedly increased in the last decade [...].
摘要
在过去十年中，通过物理气相沉积（PVD）技术生长纳米结构表面和薄膜的科学研究兴趣无疑有所增加[……]。
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