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通过铁电-电介质双层结构中的薄电介质层进行极化和去极化电荷注入。

Polarizing and depolarizing charge injection through a thin dielectric layer in a ferroelectric-dielectric bilayer.

作者信息

Park Hyeon Woo, Hyun Seung Dam, Lee In Soo, Lee Suk Hyun, Lee Yong Bin, Oh Minsik, Kim Beom Yong, Ryoo Seung Gyu, Hwang Cheol Seong

机构信息

Department of Materials Science and Engineering, and Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul 151-744, Republic of Korea.

出版信息

Nanoscale. 2021 Feb 4;13(4):2556-2572. doi: 10.1039/d0nr07597c.

DOI:10.1039/d0nr07597c
PMID:33476352
Abstract

Charge injection from the near-by-electrode can occur during ferroelectric switching in the ferroelectric-dielectric bilayer due to the high field applied to the adjacent dielectric layers. The aim of this study is to investigate the effect of the charge injection by separating the amount of switched polarization and the injected charge density. A dynamic model of the injection-involved switching is developed and exploited to elucidate the mechanism. The model demonstrates that the amount of injected charges, which compensates for the bound charge of the polarization, can be larger, smaller, or identical to that of the polarization. This model further describes the analytical conditions of this compensation state. The model predictions are validated by the newly introduced ramping pulse measurements involving the serially connected TiN/Hf0.5Zr0.5O2/TiN and TiN/amorphous Al2O3/TiN, which are capable of separating the injected charge from the switched polarization. The dynamic model, along with the electrical measurements, enables the quantitative prediction and estimation of the internal potential and the effective charge, which is the sum of the bound and injected charges in the bilayer. This work provides fundamental insights into field-effect devices such as the next-generation ferroelectric-field-effect-transistors with NAND architecture based on uncompensated ferroelectric charges.

摘要

在铁电-电介质双层结构的铁电开关过程中,由于施加在相邻电介质层上的高电场,可能会发生来自附近电极的电荷注入。本研究的目的是通过分离开关极化量和注入电荷密度来研究电荷注入的影响。建立并利用了一个涉及注入的开关动态模型来阐明其机制。该模型表明,补偿极化束缚电荷的注入电荷量可能大于、小于或等于极化电荷量。该模型进一步描述了这种补偿状态的分析条件。通过新引入的斜坡脉冲测量对模型预测进行了验证,该测量涉及串联连接的TiN/Hf0.5Zr0.5O2/TiN和TiN/非晶Al2O3/TiN,它们能够将注入电荷与开关极化分离。该动态模型与电学测量一起,能够对内部电势和有效电荷进行定量预测和估计,有效电荷是双层结构中束缚电荷和注入电荷的总和。这项工作为基于未补偿铁电电荷的具有与非架构的下一代铁电场效应晶体管等场效应器件提供了基本见解。

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