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二维MoSiX(X = N、P和As)中自旋-谷耦合和谷极化的理论证据。

Theoretical evidence of the spin-valley coupling and valley polarization in two-dimensional MoSiX (X = N, P, and As).

作者信息

Ai Haoqiang, Liu Di, Geng Jiazhong, Wang Shuangpeng, Lo Kin Ho, Pan Hui

机构信息

Department of Electromechanical Engineering, Faculty of Science and Technology, University of Macau, Macao SAR, 999078, P. R. China.

Institute of Applied Physics and Materials Engineering, University of Macau, Macao SAR, 999078, P. R. China.

出版信息

Phys Chem Chem Phys. 2021 Feb 4;23(4):3144-3151. doi: 10.1039/d0cp05926a.

Abstract

Very recently, the centimeter-scale MoSi2N4 monolayer was synthesized experimentally and exhibited a semiconducting nature with high mobility (Hong et al., Science, 2020, 369, 670-674). Here, we show that MoSi2N4 and its analogues, MoSi2P4 and MoSi2As4, are potential two-dimensional (2D) materials for valleytronics based on first-principles calculations. We demonstrate that the intrinsic inversion symmetry breaking and strong spin-orbital coupling lead to the remarkable spin-valley coupling in the inequivalent valleys at K and K' points, which result in not only the valley-contrasting transport properties, but also the spin and valley coupled optical selection rules. Moreover, the in-plane strain can tune the bandgaps and spin splitting or even induce an indirect-to-direct bandgap transition for promising application in the strain-tunable valleytronics. We find that the valley polarization can be generated by doping magnetic element. Our findings offer theoretical insight into the exotic physical properties of novel MoSi2N4-family materials beyond transition metal dichalcogenides.

摘要

最近,人们通过实验合成了厘米级的二硅化钼氮化物(MoSi2N4)单层,并发现其具有高迁移率的半导体特性(Hong等人,《科学》,2020年,第369卷,670 - 674页)。在此,基于第一性原理计算,我们表明MoSi2N4及其类似物MoSi2P4和MoSi2As4是用于谷电子学的潜在二维(2D)材料。我们证明,本征反演对称性破缺和强自旋 - 轨道耦合导致在K和K'点的不等价谷中出现显著的自旋 - 谷耦合,这不仅导致谷对比输运特性,还导致自旋和谷耦合光学选择规则。此外,面内应变可以调节带隙和自旋分裂,甚至诱导间接带隙到直接带隙的转变,有望应用于应变可调谷电子学。我们发现通过掺杂磁性元素可以产生谷极化。我们的研究结果为新型MoSi2N4族材料超越过渡金属二卤化物的奇异物理性质提供了理论见解。

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