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双波段纳米机电谷霍尔拓扑超材料的实验演示

Experimental Demonstration of Dual-Band Nano-Electromechanical Valley-Hall Topological Metamaterials.

作者信息

Ma Jingwen, Xi Xiang, Sun Xiankai

机构信息

Department of Electronic Engineering, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong.

出版信息

Adv Mater. 2021 Mar;33(10):e2006521. doi: 10.1002/adma.202006521. Epub 2021 Feb 4.

Abstract

Suppression of undesired backscattering of very-high-frequency elastic signals has been considered as a grand challenge in integrated phononic circuits. Originating from condensed-matter physics, valley-Hall topological insulators provide an intriguing strategy to overcome this challenge. To date, phononic valley-Hall topological insulators have been demonstrated only in bulk acoustic and mechanical systems operating at relatively low frequencies. Here, an integrated nano-electromechanical valley-Hall topological insulator operating in the very-high-frequency regime is experimentally realized. Valley kink states that are backscattering-immune against sharp bends and exhibit the "valley-momentum locking" effect simultaneously in the fundamental (≈60 MHz) and second-order (≈120 MHz) frequency bands are demonstrated. It is further shown that the propagation directions of these dual-band valley kink states are always locked to their valley pseudospins. The results not only enable various applications in very-high-frequency integrated phononic circuits with enhanced robustness and capacity, but also open the door to experimental exploration of mechanical nonlinearities, particularly those involving the fundamental and second-order frequencies, in topologically nontrivial nanostructures.

摘要

抑制甚高频弹性信号的有害背散射一直被视为集成声子电路中的一项重大挑战。源于凝聚态物理的谷霍尔拓扑绝缘体提供了一种引人入胜的策略来克服这一挑战。迄今为止,声子谷霍尔拓扑绝缘体仅在相对低频运行的体声波和机械系统中得到了证明。在此,通过实验实现了一种在甚高频 regime 运行的集成纳米机电谷霍尔拓扑绝缘体。展示了谷扭结态,其在基频(≈60 MHz)和二次谐波频率(≈120 MHz)频段对急剧弯曲具有背散射免疫,并且同时表现出“谷动量锁定”效应。进一步表明,这些双频段谷扭结态的传播方向始终锁定在它们的谷赝自旋上。这些结果不仅使在具有增强鲁棒性和容量的甚高频集成声子电路中实现各种应用成为可能,而且还为在拓扑非平凡纳米结构中对机械非线性,特别是那些涉及基频和二次谐波频率的机械非线性进行实验探索打开了大门。

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