Department of Implantology, Paulista University, São Paulo, Brazil.
Department of Dentistry, Santo Amaro University, São Paulo, Brazil.
PLoS One. 2021 Feb 4;16(2):e0245800. doi: 10.1371/journal.pone.0245800. eCollection 2021.
The aim of this in vitro study was to evaluate the stress distribution on three implant models with narrow and extra-narrow diameters using the finite element method (FEA).
Dental implants of extra-narrow diameter of 2.5 mm for a one-piece implant (group G1), a narrow diameter of 3.0 mm for a one-piece implant (group G2) and a narrow diameter of 3.5 mm for a two-piece implant with a Morse taper connection (group G3). A three-dimensional model was designed with cortical and cancellous bone, a crown and an implant/abutment set of each group. Axial and angled (30°) loads of 150 N was applied. The equivalent von Mises stress was used for the implants and peri-implant bone plus the Mohr-Coulomb analysis to confirm the data of the peri-implant bone.
In the axial load, the maximum stress value of the cortical bone for the group G1 was 22.35% higher than that the group G2 and 321.23% than the group G3. Whereas in angled load, the groups G1 and G2 showing a similar value (# 3.5%) and a highest difference for the group G3 (391.8%). In the implant structure, the group G1 showed a value of 2188MPa, 93.6% higher than the limit.
The results of this study show that the extra-narrow one-piece implant should be used with great caution, especially in areas of non-axial loads, whereas the one- and two-piece narrow-diameter implants show adequate behavior in both directions of the applied load.
本体外研究的目的是使用有限元法(FEA)评估三种窄径和超窄径种植体模型的应力分布。
设计了三种种植体模型,包括超窄径 2.5mm 的一体式种植体(G1 组)、窄径 3.0mm 的一体式种植体(G2 组)和带有莫氏锥度连接的窄径 3.5mm 的两段式种植体(G3 组)。每个组的皮质骨和松质骨、牙冠和种植体/基台套装都设计了一个三维模型。施加轴向和斜向(30°)150N 的负载。使用等效 von Mises 应力来评估种植体和种植体周围骨的情况,并使用 Mohr-Coulomb 分析来确认种植体周围骨的数据。
在轴向负载下,G1 组皮质骨的最大应力值比 G2 组高 22.35%,比 G3 组高 321.23%。而在斜向负载下,G1 组和 G2 组的数值相似(#3.5%),G3 组的差异最大(391.8%)。在种植体结构中,G1 组的数值为 2188MPa,比极限值高 93.6%。
本研究结果表明,超窄径一体式种植体应谨慎使用,特别是在非轴向负载区域,而单段和双段窄径种植体在施加负载的两个方向上均表现出良好的性能。