演示环形自由电子激光作为极紫外光刻工具的情况。

Demonstration of a ring-FEL as an EUV lithography tool.

作者信息

Lee Jaeyu, Jang G, Kim J, Oh B, Kim D E, Lee S, Kim J H, Ko J, Min C, Shin S

机构信息

Pohang Accelerator Laboratory, POSTECH, Pohang, Gyungbuk 37673, Republic of Korea.

Department of Physics, POSTECH, Pohang, Gyungbu 37673, Republic of Korea.

出版信息

J Synchrotron Radiat. 2020 Jul 1;27(Pt 4):864-869. doi: 10.1107/S1600577520005676. Epub 2020 May 20.

DOI:10.1107/S1600577520005676

PMID:33565994

Abstract

This paper presents the required structure and function of a ring-FEL as a radiation source for extreme ultraviolet radiation lithography (EUVL). A 100 m-long straight section that conducts an extremely low emittance beam from a fourth-generation storage ring can increase the average power at 13.5 nm wavelength to up to 1 kW without degrading the beam in the rest of the ring. Here, simulation results for a ring-FEL as a EUVL source are described.

摘要

本文介绍了作为极紫外光刻（EUVL）辐射源的环形自由电子激光（ring-FEL）所需的结构和功能。一个100米长的直线段，用于传输来自第四代存储环的极低发射度光束，可以将13.5纳米波长的平均功率提高到1千瓦，而不会使环的其余部分的光束质量下降。这里描述了作为EUVL源的环形自由电子激光的模拟结果。