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一种用于极紫外光刻的基于同步加速器的千瓦级辐射源。

A synchrotron-based kilowatt-level radiation source for EUV lithography.

作者信息

Jiang Bocheng, Feng Chao, Li Changliang, Bai Zhenghe, Wan Weishi, Xiang Dao, Gu Qiang, Wang Kun, Zhang Qinglei, Huang Dazhang, Chen Senyu

机构信息

Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai, 201204, China.

Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai, 201800, China.

出版信息

Sci Rep. 2022 Feb 28;12(1):3325. doi: 10.1038/s41598-022-07323-z.

Abstract

A compact damping ring with a limited circumference of about 160 m is proposed for producing kilowatt-level coherent EUV radiation. The electron bunch in the storage ring is modulated by a 257 nm wavelength seed laser with the help of the angular-dispersion-induced micro-bunching method (Feng and Zhao in Sci Rep 7:4724, 2017), coherent radiation at 13.5 nm with an average power of about 2.5 kW can be achieved with the state-of-the-art accelerator and laser technologies.

摘要

为了产生千瓦级的相干极紫外辐射,提出了一种周长约为160米的紧凑型阻尼环。利用角色散诱导微聚束方法(Feng和Zhao,《科学报告》7:4724,2017),存储环中的电子束团由波长为257纳米的种子激光进行调制,借助最先进的加速器和激光技术,可实现平均功率约为2.5千瓦、波长为13.5纳米的相干辐射。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ada0/8885752/1edb23657620/41598_2022_7323_Fig1_HTML.jpg

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