Schröder Stefan, Hinz Alexander M, Strunskus Thomas, Faupel Franz
Chair for Multicomponent Materials, Institute for Materials Science, Kiel University, 24143 Kiel, Germany.
J Phys Chem A. 2021 Feb 25;125(7):1661-1667. doi: 10.1021/acs.jpca.0c11180. Epub 2021 Feb 12.
The combination of organic chemistry and chemical vapor deposition enables a unique way to deposit conformal, high quality polymer thin films from the vapor phase. Particularly initiated chemical vapor deposition (iCVD) has recently shown its great potential in many different application fields. With the ever-increasing demands on the process, the need for additional process refinement is also growing. In this study the enhancement of the iCVD process by in-situ mass spectrometry is presented. The approach enables insight into real-time reaction kinetics during the deposition process as well as identification of reaction pathways. Furthermore, the composition of the gas phase can be precisely controlled and spontaneously adjusted if necessary. Particularly the deposition of thin films with thicknesses in the low nanometer range and the deposition of copolymers can benefit from this approach. The presented approach enables enhanced process control as well as the ability to perform extensive kinetic studies.
有机化学与化学气相沉积相结合，提供了一种从气相沉积保形、高质量聚合物薄膜的独特方法。特别是引发化学气相沉积（iCVD）最近在许多不同的应用领域显示出巨大潜力。随着对该工艺要求的不断提高，对进一步工艺优化的需求也在增加。本研究介绍了通过原位质谱法增强iCVD工艺。该方法能够深入了解沉积过程中的实时反应动力学，并识别反应途径。此外，可以精确控制气相组成，并在必要时自动调整。特别是低纳米范围内厚度的薄膜沉积和共聚物的沉积可以从这种方法中受益。所提出的方法能够增强工艺控制，并具备进行广泛动力学研究的能力。
