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用于锌压铸合金的无氰环保型铜电镀替代工艺。

Cyanide-free environment-friendly alternative to copper electroplating for zinc die-cast alloys.

作者信息

Rico-Yuson Christine Adelle, Hornyak G Louis, Bora Tanujjal

机构信息

Center of Excellence in Nanotechnology, School of Engineering and Technology, Asian Institute of Technology, PO Box 4, Klong Luang, Pathumthani, 12120, Thailand.

Department of Physics, College of Arts and Sciences, Central Mindanao University, Musuan, 8710, Maramag, Bukidnon, Philippines.

出版信息

Environ Sci Pollut Res Int. 2021 Jul;28(28):38065-38073. doi: 10.1007/s11356-021-13398-4. Epub 2021 Mar 16.

Abstract

In this paper, a cyanide-free electroplating bath containing glutamate as a complexing agent is investigated as an environment-friendly alternative for copper plating on zinc die-cast alloys. Glutamate reacts with copper in an aqueous solution that exhibits similar copper cyanide properties by forming complexes. The electroplating bath pH is chosen from equilibrium diagrams to avoid the formation of insoluble complexes and oxides at varying copper-to-glutamate molar ratio. The plating bath's electrochemical response on a stationary electrode confirms that a 1:3 molar ratio between copper and glutamate at pH 8 exhibits better copper deposition onto the substrate, with its morphology characterized using SEM. The results suggest that the copper glutamate electroplating bath can be suitable for copper cyanide bath replacement without additives, allowing a one-step electroplating process. Moreover, the polarization and electrochemical impedance measurements suggest inhibition of the substrate's corrosion when copper was electroplated at a 1:3 copper-to-glutamate molar ratio. With the careful control of the concentration ratio, the process can provide adequate copper deposition and anti-corrosion capability suitable for green nanocoating applications.

摘要

在本文中,研究了一种以谷氨酸作为络合剂的无氰电镀液,作为在锌压铸合金上进行铜电镀的环保替代方案。谷氨酸在水溶液中与铜发生反应,通过形成络合物表现出类似氰化铜的性质。根据平衡图选择电镀液的pH值,以避免在不同的铜与谷氨酸摩尔比下形成不溶性络合物和氧化物。在固定电极上对电镀液的电化学响应证实,在pH值为8时,铜与谷氨酸的摩尔比为1:3时,在基底上的铜沉积效果更好,并用扫描电子显微镜对其形态进行了表征。结果表明,谷氨酸铜电镀液无需添加剂即可替代氰化铜镀液,实现一步电镀工艺。此外,极化和电化学阻抗测量表明,当铜与谷氨酸的摩尔比为1:3时进行电镀,可抑制基底的腐蚀。通过仔细控制浓度比,该工艺可为绿色纳米涂层应用提供足够的铜沉积和抗腐蚀能力。

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