Saxena Nishant, Raghunathan Rajamani, Manivannan Anbarasu
Phase Change Memory Lab, Advanced Memory and Computing Group, Department of Electrical Engineering, Indian Institute of Technology Madras, Chennai, 600036, India.
UGC-DAE Consortium for Scientific Research, DAVV Campus, Khandwa Road, Indore, Madhya Pradesh, 452001, India.
Sci Rep. 2021 Mar 17;11(1):6111. doi: 10.1038/s41598-021-85690-9.
Phase change materials exhibit threshold switching (TS) that establishes electrical conduction through amorphous material followed by Joule heating leading to its crystallization (set). However, achieving picosecond TS is one of the key challenges for realizing non-volatile memory operations closer to the speed of computing. Here, we present a trajectory map for enabling picosecond TS on the basis of exhaustive experimental results of voltage-dependent transient characteristics of GeSbTe phase-change memory (PCM) devices. We demonstrate strikingly faster switching, revealing an extraordinarily low delay time of less than 50 ps for an over-voltage equal to twice the threshold voltage. Moreover, a constant device current during the delay time validates the electronic nature of TS. This trajectory map will be useful for designing PCM device with SRAM-like speed.
相变材料表现出阈值开关(TS)特性,即通过非晶材料建立导电,随后通过焦耳热导致其结晶(置位)。然而,实现皮秒级的阈值开关是实现接近计算速度的非易失性存储操作的关键挑战之一。在此,我们基于对GeSbTe相变存储器(PCM)器件电压相关瞬态特性的详尽实验结果,给出了一个实现皮秒级阈值开关的轨迹图。我们展示了显著更快的开关速度,对于等于两倍阈值电压的过电压,延迟时间极低,不到50皮秒。此外,延迟时间内器件电流恒定,验证了阈值开关的电子特性。该轨迹图将有助于设计具有类似静态随机存取存储器(SRAM)速度的PCM器件。