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单晶硼掺杂金刚石颗粒的纳米级反应性映射

Nanoscale Reactivity Mapping of a Single-Crystal Boron-Doped Diamond Particle.

作者信息

Ando Tomohiro, Asai Kai, Macpherson Julie, Einaga Yasuaki, Fukuma Takeshi, Takahashi Yasufumi

机构信息

Division of Electrical Engineering and Computer Science, Kanazawa University, Kakuma-machi, Kanazawa 920-1192, Japan.

Department of Chemistry, Keio University, 3-14-1 Hiyoshi, Yokohama 223-8522, Japan.

出版信息

Anal Chem. 2021 Apr 13;93(14):5831-5838. doi: 10.1021/acs.analchem.1c00053. Epub 2021 Mar 30.

Abstract

Boron-doped diamond (BDD) is most often grown by chemical vapor deposition (CVD) in polycrystalline form, where the electrochemical response is averaged over the whole surface. Deconvoluting the impact of crystal orientation, surface termination, and boron-doped concentration on the electrochemical response is extremely challenging. To tackle this problem, we use CVD to grow isolated single-crystal microparticles of BDD with the crystal facets (100, square-shaped) and (111, triangle-shaped) exposed and combine with hopping mode scanning electrochemical cell microscopy (HM-SECCM) for electrochemical interrogation of the individual crystal faces (planar and nonplanar). Measurements are made on both hydrogen- (H-) and oxygen (O-)-terminated single-crystal facets with two different redox mediators, [Ru(NH)] and Fe(CN). Extraction of the half-wave potential from linear sweep and cyclic voltammetric experiments at all measurement (pixel) points shows unequivocally that electron transfer is faster at the H-terminated (111) surface than at the H-terminated (100) face, attributed to boron dopant differences. The most dramatic differences were seen for [Ru(NH)] when comparing the O-terminated (100) surface to the H-terminated (100) face. Removal of the H-surface conductivity layer and a potential-dependent density of states were thought to be responsible for the behavior observed. Finally, a bimodal distribution in the electrochemical activity on the as-grown H-terminated polycrystalline BDD electrode is attributed to the dominance of differently doped (100) and (111) facets in the material.

摘要

硼掺杂金刚石(BDD)通常通过化学气相沉积(CVD)以多晶形式生长,其电化学响应是整个表面的平均值。解析晶体取向、表面终止和硼掺杂浓度对电化学响应的影响极具挑战性。为解决这一问题,我们利用CVD生长出孤立的BDD单晶微粒,使其暴露(100,方形)和(111,三角形)晶面,并结合跳跃模式扫描电化学池显微镜(HM-SECCM)对各个晶面(平面和非平面)进行电化学检测。使用两种不同的氧化还原介质[Ru(NH)]和Fe(CN)对氢(H-)和氧(O-)终止的单晶面进行测量。在所有测量(像素)点进行线性扫描和循环伏安实验,提取半波电位,结果明确显示,由于硼掺杂剂的差异,H终止的(111)表面的电子转移比H终止的(100)面更快。将O终止的(100)表面与H终止的(100)面进行比较时,[Ru(NH)]的差异最为显著。H表面导电层的去除和与电位相关的态密度被认为是观察到的这种行为的原因。最后,生长态的H终止多晶BDD电极上电化学活性的双峰分布归因于材料中不同掺杂的(100)和(111)面占主导地位。

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