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填充二维二硫化钨(WS)和二硒化钨(WSe)单层中的激子陷阱态。

Filling Exciton Trap-States in Two-Dimensional Tungsten Disulfide (WS) and Diselenide (WSe) Monolayers.

作者信息

Ezgi Eroglu Zeynep, Contreras Dillon, Bahrami Pouya, Azam Nurul, Mahjouri-Samani Masoud, Boulesbaa Abdelaziz

机构信息

Department of Chemistry & Biochemistry, California State University, Northridge, 18111 Nordhoff Street, Northridge, CA 91330, USA.

Department of Electrical and Computer Engineering, Auburn University, Auburn, AL 36849, USA.

出版信息

Nanomaterials (Basel). 2021 Mar 18;11(3):770. doi: 10.3390/nano11030770.

Abstract

Two-dimensional transition metal dichalcogenides (2D-TMDs) hold a great potential to platform future flexible optoelectronics. The beating hearts of these materials are their excitons known as X and X, which arise from transitions between spin-orbit split (SOS) levels in the conduction and valence bands at the K-point. The functionality of 2D-TMD-based devices is determined by the dynamics of these excitons. One of the most consequential channels of exciton decay on the device functionality is the defect-assisted recombination (DAR). Here, we employ steady-state absorption and emission spectroscopies, and pump density-dependent femtosecond transient absorption spectroscopy to report on the effect of DAR on the lifetime of excitons in monolayers of tungsten disulfide (2D-WS) and diselenide (2D-WSe). These pump-probe measurements suggested that while exciton decay dynamics in both monolayers are driven by DAR, in 2D-WS, defect states near the X exciton fill up before those near the X exciton. However, in the 2D-WSe monolayer, the defect states fill up similarly. Understanding the contribution of DAR on the lifetime of excitons and the partition of this decay channel between X and X excitons may open new horizons for the incorporation of 2D-TMD materials in future optoelectronics.

摘要

二维过渡金属二硫属化物(2D-TMDs)在未来柔性光电子学领域具有巨大的潜力。这些材料的核心是被称为X和X的激子,它们源自K点处导带和价带中自旋轨道分裂(SOS)能级之间的跃迁。基于2D-TMD的器件功能由这些激子的动力学决定。激子衰变对器件功能影响最大的途径之一是缺陷辅助复合(DAR)。在这里,我们采用稳态吸收和发射光谱,以及泵浦密度依赖的飞秒瞬态吸收光谱,来报道DAR对二硫化钨(2D-WS)和二硒化钨(2D-WSe)单层中激子寿命的影响。这些泵浦-探测测量表明,虽然两种单层中的激子衰变动力学均由DAR驱动,但在2D-WS中,X激子附近的缺陷态在X激子附近的缺陷态之前被填满。然而,在2D-WSe单层中,缺陷态的填充情况类似。了解DAR对激子寿命的贡献以及这种衰变通道在X和X激子之间的分配,可能为在未来光电子学中纳入2D-TMD材料开辟新的前景。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/eefe/8002918/e78451644f78/nanomaterials-11-00770-g001.jpg

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