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通过“铜”和“钒”对二硫化钼进行掺杂:提高析氢活性的有效策略。

Doping of MoS by "Cu" and "V": An Efficient Strategy for the Enhancement of Hydrogen Evolution Activity.

作者信息

Sharma Mamta Devi, Mahala Chavi, Modak Brindaban, Pande Surojit, Basu Mrinmoyee

机构信息

Department of Chemistry, BITS Pilani, Pilani Campus, Rajasthan 333031, India.

Theoretical Chemistry Section, Bhabha Atomic Research Centre, Mumbai 400085, India.

出版信息

Langmuir. 2021 Apr 27;37(16):4847-4858. doi: 10.1021/acs.langmuir.1c00036. Epub 2021 Apr 12.

Abstract

To replace Pt-based compounds in the electrocatalytic hydrogen evolution reaction (HER), MoS has already been established as an efficient catalyst. The electrocatalytic activity of MoS is further improved by tuning the morphology and the electronic structure through doping, which helps the band energy position to be modified. Presently, thin sheets of MoS (MoS-TSs) are synthesized via a microwave technique. Thin sheets of MoS can outperform nanosheets of MoS in the HER. Further, the efficiency of the thin sheets is improved by doping with different metals like Cu, V, Zn, Mn, Fe, Sn, etc. "Cu"- and "V"-doped MoS-TSs are highly efficient for the HER. At a fixed potential of -0.588 V vs RHE, Cu-doped MoS (Cu-MoS-TS), V-doped MoS (V-MoS-TS), and MoS-TS can generate current densities of 327.46, 308.45, and 127.82 mA/cm, respectively. The electrochemically active surface area increases nearly 7.7-fold and 2.5-fold for Cu-MoS-TS and V-MoS-TS than for MoS-TS, respectively. Cu-MoS-TS shows exceptionally high electrocatalytic stability up to 140 h in an acidic medium (0.5 M HSO). First-principles calculations using density functional theory (DFT) are performed, which are well matched with the experimental observations. DFT calculations dictate that after doping with "V" and "Cu" both valance band maxima and conduction band minima are uplifted, which indicates the higher hydrogen-ion-reducing ability of M-MoS-TS (M = Cu, V) compared to bare MoS-TS.

摘要

为了在电催化析氢反应(HER)中替代基于铂的化合物,二硫化钼(MoS)已被确立为一种高效催化剂。通过掺杂来调整二硫化钼的形态和电子结构,可进一步提高其电催化活性,这有助于改变能带能量位置。目前,通过微波技术合成了二硫化钼薄片(MoS-TSs)。在析氢反应中,二硫化钼薄片的性能优于二硫化钼纳米片。此外,通过掺杂不同金属如铜(Cu)、钒(V)、锌(Zn)、锰(Mn)、铁(Fe)、锡(Sn)等,薄片的效率得到提高。“铜”和“钒”掺杂的MoS-TSs对析氢反应具有很高的效率。在相对于可逆氢电极(RHE)为-0.588 V的固定电位下,铜掺杂的二硫化钼(Cu-MoS-TS)、钒掺杂的二硫化钼(V-MoS-TS)和MoS-TS分别可产生327.46、308.45和127.82 mA/cm²的电流密度。与MoS-TS相比,Cu-MoS-TS和V-MoS-TS的电化学活性表面积分别增加了近7.7倍和2.5倍。Cu-MoS-TS在酸性介质(0.5 M H₂SO₄)中表现出高达140小时的异常高的电催化稳定性。使用密度泛函理论(DFT)进行了第一性原理计算,计算结果与实验观察结果非常吻合。DFT计算表明,掺杂“钒”和“铜”后,价带最大值和导带最小值均升高,这表明与裸MoS-TS相比,M-MoS-TS(M = Cu,V)具有更高的氢离子还原能力。

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