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图案化工具包FIB-o-mat:充分发挥聚焦氦离子在纳米加工方面的全部潜力。

The patterning toolbox FIB-o-mat: Exploiting the full potential of focused helium ions for nanofabrication.

作者信息

Deinhart Victor, Kern Lisa-Marie, Kirchhof Jan N, Juergensen Sabrina, Sturm Joris, Krauss Enno, Feichtner Thorsten, Kovalchuk Sviatoslav, Schneider Michael, Engel Dieter, Pfau Bastian, Hecht Bert, Bolotin Kirill I, Reich Stephanie, Höflich Katja

机构信息

Ferdinand-Braun-Institut gGmbH, Leibniz-Institut für Höchstfrequenztechnik, Gustav-Kirchhoff-Str. 4, 12489 Berlin, Germany.

Corelab Correlative Microscopy and Spectroscopy, Helmholtz-Zentrum Berlin für Materialien und Energie, Hahn-Meitner-Platz 1, 14109 Berlin, Germany.

出版信息

Beilstein J Nanotechnol. 2021 Apr 6;12:304-318. doi: 10.3762/bjnano.12.25. eCollection 2021.

DOI:10.3762/bjnano.12.25
PMID:33889477
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC8042487/
Abstract

Focused beams of helium ions are a powerful tool for high-fidelity machining with spatial precision below 5 nm. Achieving such a high patterning precision over large areas and for different materials in a reproducible manner, however, is not trivial. Here, we introduce the Python toolbox FIB-o-mat for automated pattern creation and optimization, providing full flexibility to accomplish demanding patterning tasks. FIB-o-mat offers high-level pattern creation, enabling high-fidelity large-area patterning and systematic variations in geometry and raster settings. It also offers low-level beam path creation, providing full control over the beam movement and including sophisticated optimization tools. Three applications showcasing the potential of He ion beam nanofabrication for two-dimensional material systems and devices using FIB-o-mat are presented.

摘要

聚焦的氦离子束是一种强大的工具,可用于空间精度低于5纳米的高保真加工。然而,要以可重复的方式在大面积上对不同材料实现如此高的图案化精度并非易事。在此,我们介绍用于自动图案创建和优化的Python工具箱FIB-o-mat,它提供了充分的灵活性来完成苛刻的图案化任务。FIB-o-mat提供高级图案创建功能,能够实现高保真大面积图案化以及几何形状和光栅设置的系统变化。它还提供低级光束路径创建功能,可对光束移动进行全面控制,并包括复杂的优化工具。本文展示了三个应用实例,展示了使用FIB-o-mat的氦离子束纳米加工在二维材料系统和器件方面的潜力。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/86dc/8042487/998ed7886536/Beilstein_J_Nanotechnol-12-304-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/86dc/8042487/5c7be05429ff/Beilstein_J_Nanotechnol-12-304-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/86dc/8042487/4c0fb2246db7/Beilstein_J_Nanotechnol-12-304-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/86dc/8042487/7927e5ae437c/Beilstein_J_Nanotechnol-12-304-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/86dc/8042487/a74d89370f14/Beilstein_J_Nanotechnol-12-304-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/86dc/8042487/0c9f15dc743d/Beilstein_J_Nanotechnol-12-304-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/86dc/8042487/2347d70c4c26/Beilstein_J_Nanotechnol-12-304-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/86dc/8042487/c77b952a4f40/Beilstein_J_Nanotechnol-12-304-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/86dc/8042487/998ed7886536/Beilstein_J_Nanotechnol-12-304-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/86dc/8042487/5c7be05429ff/Beilstein_J_Nanotechnol-12-304-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/86dc/8042487/4c0fb2246db7/Beilstein_J_Nanotechnol-12-304-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/86dc/8042487/7927e5ae437c/Beilstein_J_Nanotechnol-12-304-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/86dc/8042487/a74d89370f14/Beilstein_J_Nanotechnol-12-304-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/86dc/8042487/0c9f15dc743d/Beilstein_J_Nanotechnol-12-304-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/86dc/8042487/2347d70c4c26/Beilstein_J_Nanotechnol-12-304-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/86dc/8042487/c77b952a4f40/Beilstein_J_Nanotechnol-12-304-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/86dc/8042487/998ed7886536/Beilstein_J_Nanotechnol-12-304-g009.jpg

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