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紫外光调制的碲化钼/氮化硼异质结构的突触行为

UV light modulated synaptic behavior of MoTe/BN heterostructure.

作者信息

Zhang Jing, Ma Xinli, Song Xiaoming, Hu Xiaodong, Wu Enxiu, Liu Jing

机构信息

State Key Laboratory of Precision Measurement Technology and Instruments, School of Precision Instruments and Opto-electronics Engineering, Tianjin University, NO.92 Weijin Road, Tianjin, 300072, People's Republic of China.

出版信息

Nanotechnology. 2021 Sep 2;32(47). doi: 10.1088/1361-6528/abfc0a.

Abstract

Electrical synaptic devices are the basic components for the hardware based neuromorphic computational systems, which are expected to break the bottleneck of current von Neumann architecture. So far, synaptic devices based on three-terminal transistors are considered to provide the most stable performance, which usually use gate pulses to modulate the channel conductance through a floating gate and/or charge trapping layer. Herein, we report a three-terminal synaptic device based on a two-dimensional molybdenum ditelluride (MoTe)/hexagonal boron nitride (hBN) heterostructure. This structure enables stable and prominent conductance modulation of the MoTechannel by the photo-induced doping method through electron migration between the MoTechannel and ultraviolet (UV) light excited mid-gap defect states in hBN. Therefore, it is free of the floating gate and charge trapping layer to reduce the thickness and simplify the fabrication/design of the device. Moreover, since UV illumination is indispensable for stable doping in MoTechannel, the device can realize both short- (without UV illumination) and long- (with UV illumination) term plasticity. Meanwhile, the introduction of UV light allows additional tunability on the MoTechannel conductance through the wavelength and power intensity of incident UV, which may be important to mimic advanced synaptic functions. In addition, the photo-induced doping method can bidirectionally dope MoTechannel, which not only leads to large high/low resistance ratio for potential multi-level storage, but also implement both potentiation (n-doping) and depression (p-doping) of synaptic weight. This work explores alternative three-terminal synaptic configuration without floating gate and charge trapping layer, which may inspire researches on novel electrical synapse mechanisms.

摘要

电突触器件是基于硬件的神经形态计算系统的基本组件,有望突破当前冯·诺依曼架构的瓶颈。到目前为止,基于三端晶体管的突触器件被认为具有最稳定的性能,这类器件通常利用栅极脉冲通过浮栅和/或电荷俘获层来调制沟道电导。在此,我们报道了一种基于二维碲化钼(MoTe)/六方氮化硼(hBN)异质结构的三端突触器件。这种结构通过光致掺杂方法,利用MoTe沟道与hBN中紫外(UV)光激发的带隙中间缺陷态之间的电子迁移,实现了对MoTe沟道稳定且显著的电导调制。因此,该器件无需浮栅和电荷俘获层,从而减小了厚度并简化了器件的制造/设计。此外,由于UV光照对于MoTe沟道中的稳定掺杂是必不可少的,该器件能够实现短期(无UV光照)和长期(有UV光照)可塑性。同时,UV光的引入使得可以通过入射UV的波长和功率强度对MoTe沟道电导进行额外的调节,这对于模拟先进的突触功能可能很重要。另外,光致掺杂方法可以对MoTe沟道进行双向掺杂,这不仅导致了用于潜在多级存储的大的高/低电阻比,还实现了突触权重的增强(n型掺杂)和抑制(p型掺杂)。这项工作探索了一种没有浮栅和电荷俘获层的替代三端突触配置,这可能会激发对新型电突触机制的研究。

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