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小像素碲锌镉传感器的制造及X射线表征

Fabrication of Small-Pixel CdZnTe Sensors and Characterization with X-rays.

作者信息

Tsigaridas Stergios, Zanettini Silvia, Bettelli Manuele, Amadè Nicola Sarzi, Calestani Davide, Ponchut Cyril, Zappettini Andrea

机构信息

European Synchrotron Radiation Facility (ESRF), 71 Avenue des Martyrs, F-38043 Grenoble, France.

Due2lab s.r.l., via Paolo Borsellino 2, 42019 Scandiano, Italy.

出版信息

Sensors (Basel). 2021 Apr 22;21(9):2932. doi: 10.3390/s21092932.

Abstract

Over the past few years, sensors made from high-Z compound semiconductors have attracted quite some attention for use in applications which require the direct detection of X-rays in the energy range 30-100 keV. One of the candidate materials with promising properties is cadmium zinc telluride (CdZnTe). In the context of this article, we have developed pixelated sensors from CdZnTe crystals grown by Boron oxide encapsulated vertical Bridgman technique. We demonstrate the successful fabrication of CdZnTe pixel sensors with a fine pitch of 55 m and thickness of 1 mm and 2 mm. The sensors were bonded on Timepix readout chips to evaluate their response to X-rays provided by conventional sources. Despite the issues related to single-chip fabrication procedure, reasonable uniformity was achieved along with low leakage current values at room temperature. In addition, the sensors show stable performance over time at moderate incoming fluxes, below 106 photons mm-2s-1.

摘要

在过去几年中,由高原子序数化合物半导体制成的传感器在需要直接检测能量范围为30 - 100 keV的X射线的应用中引起了相当多的关注。具有良好性能的候选材料之一是碲锌镉(CdZnTe)。在本文中,我们用氧化硼封装垂直布里奇曼技术生长的CdZnTe晶体开发了像素化传感器。我们展示了成功制造出间距为55μm、厚度为1mm和2mm的CdZnTe像素传感器。这些传感器被粘结在Timepix读出芯片上,以评估它们对传统源提供的X射线的响应。尽管存在与单芯片制造工艺相关的问题,但在室温下仍实现了合理的均匀性以及低漏电流值。此外,在中等入射通量(低于10⁶光子·mm⁻²·s⁻¹)下,传感器随时间表现出稳定的性能。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/338c/8122653/3714a8ceef10/sensors-21-02932-g001.jpg

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