Gomez Andrés, Vila-Fungueiriño José Manuel, Jolly Claire, Garcia-Bermejo Ricardo, Oró-Solé Judith, Ferain Etienne, Mestres Narcís, Magén César, Gazquez Jaume, Rodriguez-Carvajal Juan, Carretero-Genevrier Adrián
Institut de Ciència de Materials de Barcelona ICMAB, Consejo Superior de Investigaciones Científicas CSIC, Campus UAB 08193 Bellaterra, Catalonia, Spain.
Nanoscale. 2021 Jun 3;13(21):9615-9625. doi: 10.1039/d1nr00565k.
Ferroelectric oxides have attracted much attention due to their wide range of applications, particularly in electronic devices such as nonvolatile memories and tunnel junctions. As a result, the monolithic integration of these materials into silicon technology and their nanostructuration to develop alternative cost-effective processes are among the central points in the current technology. In this work, we used a chemical route to obtain nanowire thin films of a novel Sr1+δMn8O16 (SMO) hollandite-type manganese oxide on silicon. Scanning transmission electron microscopy combined with crystallographic computing reveals a crystal structure comprising hollandite and pyrolusite units sharing the edges of their MnO6 octahedra, resulting in three types of tunnels arranged along the c axis, where the ordering of the Sr atoms produces natural symmetry breaking. The novel structure gives rise to ferroelectricity and piezoelectricity, as revealed by local direct piezoelectric force microscopy measurements, which confirmed the ferroelectric nature of the SMO nanowire thin films at room temperature and showed a piezoelectric coefficient d33 value of 22 ± 6 pC N-1. Moreover, we proved that flexible vertical SMO nanowires can be harvested providing an electrical output energy through the piezoelectric effect, showing excellent deformability and high interface recombination. This work indicates the possibility of engineering the integration of 1D manganese oxides on silicon, a step which precedes the production of microelectronic devices.
铁电氧化物因其广泛的应用而备受关注,特别是在诸如非易失性存储器和隧道结等电子器件中。因此,将这些材料单片集成到硅技术中以及对其进行纳米结构化以开发替代的经济高效工艺是当前技术的核心要点之一。在这项工作中,我们采用化学方法在硅上获得了一种新型的Sr1+δMn8O16(SMO)钙钛矿型锰氧化物的纳米线薄膜。扫描透射电子显微镜结合晶体学计算揭示了一种晶体结构,该结构由钙钛矿和软锰矿单元共享其MnO6八面体的边缘组成,从而沿c轴形成三种类型的隧道,其中Sr原子的有序排列导致了自然的对称性破缺。这种新颖的结构产生了铁电性和压电性,如局部直接压电力显微镜测量所揭示的那样,该测量证实了SMO纳米线薄膜在室温下的铁电性质,并显示出压电系数d33值为22±6 pC N-1。此外,我们证明了可以收获柔性垂直SMO纳米线,通过压电效应提供电输出能量,显示出优异的可变形性和高界面复合率。这项工作表明了在硅上对一维锰氧化物进行集成工程的可能性,这是生产微电子器件之前的一个步骤。