1] IBM T.J. Watson Research Center, 1101 Kitchawan Road, Yorktown Heights, New York 10598, USA [2].
Nat Nanotechnol. 2013 Oct;8(10):748-54. doi: 10.1038/nnano.2013.192. Epub 2013 Sep 29.
Epitaxial growth of SrTiO₃ on silicon by molecular beam epitaxy has opened up the route to the integration of functional complex oxides on a silicon platform. Chief among them is ferroelectric functionality using perovskite oxides such as BaTiO₃. However, it has remained a challenge to achieve ferroelectricity in epitaxial BaTiO₃ films with a polarization pointing perpendicular to the silicon substrate without a conducting bottom electrode. Here, we demonstrate ferroelectricity in such stacks. Synchrotron X-ray diffraction and high-resolution scanning transmission electron microscopy reveal the presence of crystalline domains with the long axis of the tetragonal structure oriented perpendicular to the substrate. Using piezoforce microscopy, polar domains can be written and read and are reversibly switched with a phase change of 180°. Open, saturated hysteresis loops are recorded. Thus, ferroelectric switching of 8- to 40-nm-thick BaTiO₃ films in metal-ferroelectric-semiconductor structures is realized, and field-effect devices using this epitaxial oxide stack can be envisaged.
分子束外延在硅衬底上外延生长 SrTiO₃,为在硅平台上集成功能复杂氧化物开辟了道路。其中最重要的是使用钙钛矿氧化物(如 BaTiO₃)实现铁电性。然而,在没有导电底电极的情况下,在指向硅衬底垂直方向的外延 BaTiO₃ 薄膜中实现铁电性仍然是一个挑战。在这里,我们展示了这种堆叠的铁电性。同步加速器 X 射线衍射和高分辨率扫描透射电子显微镜揭示了存在具有长轴垂直于衬底的四方结构的晶畴。使用压电力显微镜,可以写入和读取极性畴,并通过 180°的相变为其反转。记录了打开的、饱和的滞后回线。因此,在金属-铁电-半导体结构中实现了 8nm 至 40nm 厚的 BaTiO₃ 薄膜的铁电开关,并且可以设想使用这种外延氧化物堆叠的场效应器件。