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泡沫镍上电沉积Ni-Se-Cu涂层的成核与生长机制

Nucleation and growth mechanisms of an electrodeposited Ni-Se-Cu coating on nickel foam.

作者信息

Tan Wenyu, He Hanwei, Gao Ying, Peng Yizhi, Dai Xiaomei

机构信息

Powder Metallurgy Research Institute, Central South University, Changsha 410083, China.

Powder Metallurgy Research Institute, Central South University, Changsha 410083, China.

出版信息

J Colloid Interface Sci. 2021 Oct 15;600:492-502. doi: 10.1016/j.jcis.2021.05.002. Epub 2021 May 5.

DOI:10.1016/j.jcis.2021.05.002
PMID:34023707
Abstract

Electrocatalysts for water splitting have been widely explored among recent years. In this study, nickel-selenium-copper (Ni-Se-Cu) coating was synthesized on nickel foam through potentiostatic electrodeposition. The electrochemical kinetics and nucleation mechanisms of the deposition were investigated, and the diffusion coefficient D from different deposition potentials and temperatures was calculated. Results reveal that the electrodeposition of Ni-Se-Cu follows an instantaneous nucleation and diffusion-controlled three-dimensional (3D) growth mechanism. Deposition potential and bath temperature slightly effect the nucleation mechanism of electrodeposition. The apparent activation energy E of the hydrogen evolution reaction (HER) in 1.0 M KOH electrolyte of Ni-Se-Cu is 21.1 kJ·mol, which is lower than that of Ni-Se (37.7 kJ·mol). The majority phase formed by nickel and selenium is NiSe, and a Ni(Cu) solid solution forms after the incorporation of Cu atoms into a Ni lattice.

摘要

近年来,用于水分解的电催化剂受到了广泛研究。在本研究中,通过恒电位电沉积在泡沫镍上合成了镍-硒-铜(Ni-Se-Cu)涂层。研究了沉积的电化学动力学和成核机制,并计算了不同沉积电位和温度下的扩散系数D。结果表明,Ni-Se-Cu的电沉积遵循瞬时成核和扩散控制的三维(3D)生长机制。沉积电位和镀液温度对电沉积的成核机制影响较小。在1.0 M KOH电解液中,Ni-Se-Cu析氢反应(HER)的表观活化能E为21.1 kJ·mol,低于Ni-Se的表观活化能(37.7 kJ·mol)。镍和硒形成的主要相为NiSe,在Cu原子掺入Ni晶格后形成Ni(Cu)固溶体。

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