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通过热 V-S 工艺制备的原始及 In、Sn 掺杂 BiSe 纳米片的光传感与表征

Photosensing and Characterizing of the Pristine and In-, Sn-Doped BiSe Nanoplatelets Fabricated by Thermal V-S Process.

作者信息

Wang Chih-Chiang, Shieu Fuh-Sheng, Shih Han C

机构信息

Department of Materials Science and Engineering, National Chung Hsing University, Taichung 40227, Taiwan.

Department of Chemical Engineering and Materials Science, Chinese Culture University, Taipei 11114, Taiwan.

出版信息

Nanomaterials (Basel). 2021 May 20;11(5):1352. doi: 10.3390/nano11051352.

Abstract

Pristine, and In-, Sn-, and (In, Sn)-doped BiSe nanoplatelets synthesized on AlO(100) substrate by a vapor-solid mechanism in thermal CVD process via at 600 °C under 2 × 10 Torr. XRD and HRTEM reveal that In or Sn dopants had no effect on the crystal structure of the synthesized rhombohedral-BiSe. FPA-FTIR reveals that the optical bandgap of doped BiSe was 26.3%, 34.1%, and 43.7% lower than pristine BiSe. XRD, FESEM-EDS, Raman spectroscopy, and XPS confirm defects (In3+Bi3+), (In3+V0), (Sn4+Bi3+), (V0Bi3+), and (Sn2+Bi3+). Photocurrent that was generated in (In,Sn)-doped BiSe under UV(8 W) and red (5 W) light revealed stable photocurrents of 5.20 × 10 and 0.35 × 10 A and high I/I ratios of 30.7 and 52.2. The rise and fall times of the photocurrent under UV light were 4.1 × 10 and 6.6 × 10 s. Under UV light, (In,Sn)-dopedBiSe had 15.3% longer photocurrent decay time and 22.6% shorter rise time than pristine BiSe, indicating that (In,Sn)-doped BiSe exhibited good surface conduction and greater photosensitivity. These results suggest that In, Sn, or both dopants enhance photodetection of pristine BiSe under UV and red light. The findings also suggest that type of defect is a more important factor than optical bandgap in determining photo-detection sensitivity. (In,Sn)-doped BiSe has greater potential than undoped BiSe for use in UV and red-light photodetectors.

摘要

通过热化学气相沉积(CVD)过程中的气固机制,在600℃、2×10托的条件下,在AlO(100)衬底上合成了纯净的以及In、Sn和(In,Sn)掺杂的BiSe纳米片。X射线衍射(XRD)和高分辨率透射电子显微镜(HRTEM)表明,In或Sn掺杂剂对合成的菱面体BiSe的晶体结构没有影响。傅里叶变换红外光谱(FPA-FTIR)显示,掺杂BiSe的光学带隙比纯净BiSe低26.3%、34.1%和43.7%。XRD、场发射扫描电子显微镜-能谱仪(FESEM-EDS)、拉曼光谱和X射线光电子能谱(XPS)证实了缺陷(In3+Bi3+)、(In3+V0)、(Sn4+Bi3+)、(V0Bi3+)和(Sn2+Bi3+)。在紫外光(8瓦)和红光(5瓦)照射下,(In,Sn)掺杂的BiSe产生的光电流显示出稳定的光电流,分别为5.20×10和0.35×10 A以及高的I/I比,分别为30.7和52.2。紫外光下光电流的上升和下降时间分别为4.1×10和6.6×10 s。在紫外光下,(In,Sn)掺杂的BiSe的光电流衰减时间比纯净BiSe长15.3%,上升时间短22.6%,表明(In,Sn)掺杂的BiSe表现出良好的表面传导性和更高的光敏性。这些结果表明,In、Sn或两者掺杂剂增强了纯净BiSe在紫外光和红光下的光探测能力。研究结果还表明,在决定光探测灵敏度方面,缺陷类型比光学带隙是更重要的因素。(In,Sn)掺杂的BiSe在紫外光和红光光电探测器中的应用潜力比未掺杂的BiSe更大。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/664b/8161412/513d3502aacf/nanomaterials-11-01352-g001.jpg

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