Suppr超能文献

通过与BiSe拓扑绝缘体形成异质结构增强非晶态铟锡锌氧化物的电学性能。

Enhanced electrical properties of amorphous In-Sn-Zn oxides through heterostructuring with BiSe topological insulators.

作者信息

Wang Chih-Chiang, Lo An-Ya, Cheng Ming-Che, Chang Yu-Sung, Shih Han-Chang, Shieu Fuh-Sheng, Tseng Tzu-Hsien, Tsai He-Ting

机构信息

Department of Chemical and Materials Engineering, National Chin-Yi University of Technology, Taichung, 411030, Taiwan.

Department of Materials Science and Engineering, National Chung Hsing University, Taichung, 40227, Taiwan.

出版信息

Sci Rep. 2024 Jan 2;14(1):195. doi: 10.1038/s41598-023-50809-7.

Abstract

Amorphous indium tin zinc oxide (a-ITZO)/BiSe nanoplatelets (NPs) were fabricated using a two-step procedure. First, BiSe NPs were synthesized through thermal chemical vapor deposition at 600 °C on a glass substrate, and then a-ITZO was deposited on the surface of the BiSe NPs via magnetron sputtering at room-temperature. The crystal structures of the a-ITZO/BiSe NPs were determined via X-ray diffraction spectroscopy and high-resolution transmission electron microscopy. The elemental vibration modes and binding energies were measured using Raman spectroscopy and X-ray photoelectron spectroscopy. The morphologies were examined using field-emission scanning electron microscopy. The electrical properties of the a-ITZO/BiSe NPs were evaluated using Hall effect measurements. The bulk carrier concentration of a-ITZO was not affected by the heterostructure with BiSe. In the case of the BiSe heterostructure, the carrier mobility and conductivity of a-ITZO were increased by 263.6% and 281.4%, respectively, whereas the resistivity of a-ITZO was reduced by 73.57%. This indicates that BiSe significantly improves the electrical properties of a-ITZO through its heterostructure, expanding its potential applications in electronic and thermoelectric devices.

摘要

采用两步法制备了非晶铟锡锌氧化物(a-ITZO)/硒化铋纳米片(NPs)。首先,通过热化学气相沉积在600℃的玻璃基板上合成硒化铋纳米片,然后在室温下通过磁控溅射在硒化铋纳米片表面沉积a-ITZO。通过X射线衍射光谱和高分辨率透射电子显微镜确定a-ITZO/硒化铋纳米片的晶体结构。使用拉曼光谱和X射线光电子能谱测量元素振动模式和结合能。用场发射扫描电子显微镜检查形貌。使用霍尔效应测量评估a-ITZO/硒化铋纳米片的电学性能。a-ITZO的体载流子浓度不受与硒化铋形成的异质结构的影响。在硒化铋异质结构的情况下,a-ITZO的载流子迁移率和电导率分别提高了263.6%和281.4%,而a-ITZO的电阻率降低了73.57%。这表明硒化铋通过其异质结构显著改善了a-ITZO的电学性能,扩大了其在电子和热电器件中的潜在应用。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/42ab/10762253/d3cc2518a31b/41598_2023_50809_Fig1_HTML.jpg

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验