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用于激光束匀化的集成双面随机微透镜阵列

Integrated Double-Sided Random Microlens Array Used for Laser Beam Homogenization.

作者信息

Yuan Wei, Xu Cheng, Xue Li, Pang Hui, Cao Axiu, Fu Yongqi, Deng Qiling

机构信息

School of Physics, University of Electronic Science and Technology of China, Chengdu 610054, China.

Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China.

出版信息

Micromachines (Basel). 2021 Jun 9;12(6):673. doi: 10.3390/mi12060673.

Abstract

Double microlens arrays (MLAs) in series can be used to divide and superpose laser beam so as to achieve a homogenized spot. However, for laser beam homogenization with high coherence, the periodic lattice distribution in the homogenized spot will be generated due to the periodicity of the traditional MLA, which greatly reduces the uniformity of the homogenized spot. To solve this problem, a monolithic and highly integrated double-sided random microlens array (D-rMLA) is proposed for the purpose of achieving laser beam homogenization. The periodicity of the MLA is disturbed by the closely arranged microlens structures with random apertures. And the random speckle field is achieved to improve the uniformity of the homogenized spot by the superposition of the divided sub-beams. In addition, the double-sided exposure technique is proposed to prepare the rMLA on both sides of the same substrate with high precision alignment to form an integrated D-rMLA structure, which avoids the strict alignment problem in the installation process of traditional discrete MLAs. Then the laser beam homogenization experiments have been carried out by using the prepared D-rMLA structure. The laser beam homogenized spots of different wavelengths have been tested, including the wavelengths of 650 nm (R), 532 nm (G), and 405 nm (B). The experimental results show that the uniformity of the RGB homogenized spots is about 91%, 89%, and 90%. And the energy utilization rate is about 89%, 87%, 86%, respectively. Hence, the prepared structure has high laser beam homogenization ability and energy utilization rate, which is suitable for wide wavelength regime.

摘要

串联的双微透镜阵列(MLA)可用于分割和叠加激光束,以实现光斑均匀化。然而,对于具有高相干性的激光束均匀化,由于传统MLA的周期性,在均匀化光斑中会产生周期性的晶格分布,这大大降低了均匀化光斑的均匀性。为了解决这个问题,提出了一种单片高度集成的双面随机微透镜阵列(D-rMLA),以实现激光束均匀化。MLA的周期性被具有随机孔径的紧密排列的微透镜结构所扰乱。通过分割子光束的叠加实现随机散斑场,以提高均匀化光斑的均匀性。此外,还提出了双面曝光技术,在同一基板的两侧高精度对准制备rMLA,形成集成的D-rMLA结构,避免了传统离散MLA安装过程中的严格对准问题。然后利用制备的D-rMLA结构进行了激光束均匀化实验。测试了不同波长的激光束均匀化光斑,包括650nm(红色)、532nm(绿色)和405nm(蓝色)的波长。实验结果表明,RGB均匀化光斑的均匀性分别约为91%、89%和90%。能量利用率分别约为89%、87%、86%。因此,所制备的结构具有高的激光束均匀化能力和能量利用率,适用于宽波长范围。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/658c/8229250/1eaaa0d2b578/micromachines-12-00673-g001.jpg

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