Lu Jingdi, Si Liang, Zhang Qinghua, Tian Chengfeng, Liu Xin, Song Chuangye, Dong Shouzhe, Wang Jie, Cheng Sheng, Qu Lili, Zhang Kexuan, Shi Youguo, Huang Houbing, Zhu Tao, Mi Wenbo, Zhong Zhicheng, Gu Lin, Held Karsten, Wang Lingfei, Zhang Jinxing
Department of Physics, Beijing Normal University, Beijing, 100875, China.
Institut für Festkörperphysik, TU Wien, Wiedner Hauptstraße 8-10, Vienna, 1040, Austria.
Adv Mater. 2021 Aug;33(33):e2102525. doi: 10.1002/adma.202102525. Epub 2021 Jul 5.
In situ electrical control of the Dzyaloshinskii-Moriya interaction (DMI) is one of the central but challenging goals toward skyrmion-based device applications. An atomic design of defective interfaces in spin-orbit-coupled transition-metal oxides can be an appealing strategy to achieve this goal. In this work, by utilizing the distinct formation energies and diffusion barriers of oxygen vacancies at SrRuO /SrTiO (001), a sharp interface is constructed between oxygen-deficient and stoichiometric SrRuO . This interfacial inversion-symmetry breaking leads to a sizable DMI, which can induce skyrmionic magnetic bubbles and the topological Hall effect in a more than 10 unit-cell-thick SrRuO . This topological spin texture can be reversibly manipulated through the migration of oxygen vacancies under electric gating. In particular, the topological Hall signal can be deterministically switched ON and OFF. This result implies that the defect-engineered topological spin textures may offer an alternate perspective for future skyrmion-based memristor and synaptic devices.
对Dzyaloshinskii-Moriya相互作用(DMI)进行原位电控制是基于斯格明子的器件应用的核心目标之一,但颇具挑战性。自旋轨道耦合过渡金属氧化物中缺陷界面的原子设计可能是实现这一目标的一种有吸引力的策略。在这项工作中,通过利用SrRuO₃/SrTiO₃(001)处氧空位不同的形成能和扩散势垒,在缺氧和化学计量比的SrRuO₃之间构建了一个清晰的界面。这种界面反转对称性破缺导致了可观的DMI,这可以在超过10个晶胞厚的SrRuO₃中诱导出斯格明子磁泡和拓扑霍尔效应。这种拓扑自旋纹理可以通过电门控下氧空位的迁移来可逆地操纵。特别是,拓扑霍尔信号可以被确定性地开启和关闭。这一结果意味着,缺陷工程化的拓扑自旋纹理可能为未来基于斯格明子的忆阻器和突触器件提供一个新的视角。
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