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过渡金属和非金属掺杂的MoS催化活性的电子描述符识别

Identification of electronic descriptors for catalytic activity of transition-metal and non-metal doped MoS.

作者信息

Xie Zijuan, Huang Xiang, Zhang Zhe, Xu Hu

机构信息

Department of Physics & Shenzhen Institute for Quantum Science and Engineering, Southern University of Science and Technology, Shenzhen 518055, China.

出版信息

Phys Chem Chem Phys. 2021 Jul 21;23(28):15101-15106. doi: 10.1039/d1cp01458g.

Abstract

While the d-band theory offers successful electronic descriptors for catalytic activity of transition metals, transition metal compounds still need substantial theoretical input for the identification of reactivity descriptors for fast screening of earth-abundant catalysts. We study transition metal (TM) and non-metal doped MoS2, a promising substitute for noble metals as catalysts for multiple reactions, to clarify how doping modifies the reactivity by regulating the electronic structure of the host. We find that doping can significantly change the density of states (DOS) at band edges and the position of the Fermi level, which renders the S p-band center εp a good descriptor for H adsorption on both TM and non-metal doped MoS2. Dopants to the left of the host elements in the periodic table that have fewer electrons pin the Fermi level into the valence band, and those to the right that have more electrons pin the Fermi level into the conduction band, resulting in separated linear relationships between H binding energy and S p-band center. Moreover, by a close examination of the electronic structure of late TM doped systems, we identify the position of the late TM dopant induced DOS peak near the conduction band minimum (CBM), εTM, as a refined descriptor which shows a linear relationship for H as well as C, N, O adsorption. Finally, we generalize our descriptor to MoSe2 and MoTe2 to include all three anions in transition metal dichalcogenides (TMDs) and show a universal scaling relationship between the H binding energy and anion p-band center. Together we further enhance our understanding on identifying electronic descriptors for TM compounds.

摘要

虽然d带理论为过渡金属的催化活性提供了成功的电子描述符,但过渡金属化合物在确定用于快速筛选储量丰富的催化剂的反应性描述符方面仍需要大量的理论投入。我们研究了过渡金属(TM)和非金属掺杂的MoS2,它是一种有望替代贵金属用于多种反应的催化剂,以阐明掺杂如何通过调节主体的电子结构来改变反应性。我们发现,掺杂可以显著改变带边的态密度(DOS)和费米能级的位置,这使得S p带中心εp成为TM和非金属掺杂的MoS2上H吸附的良好描述符。周期表中位于主体元素左侧且电子较少的掺杂剂将费米能级钉扎到价带中,而位于右侧且电子较多的掺杂剂将费米能级钉扎到导带中,导致H结合能与S p带中心之间存在分离的线性关系。此外,通过仔细研究晚期TM掺杂体系的电子结构,我们确定了晚期TM掺杂剂在导带最小值(CBM)附近诱导的DOS峰的位置εTM,作为一个精细的描述符,它对H以及C、N、O的吸附都呈现线性关系。最后,我们将我们的描述符推广到MoSe2和MoTe2,以涵盖过渡金属二卤化物(TMDs)中的所有三种阴离子,并展示了H结合能与阴离子p带中心之间的通用标度关系。我们共同进一步加深了对确定TM化合物电子描述符的理解。

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