Institute of Nano Electronic Engineering, Universiti Malaysia Perlis, 01000, Kangar, Perlis, Malaysia.
Faculty of Chemical Engineering Technology, Universiti Malaysia Perlis, 02600, Arau, Perlis, Malaysia.
Sci Rep. 2021 Jul 19;11(1):14688. doi: 10.1038/s41598-021-94145-0.
Arsenic is a major global threat to the ecosystem. Here we describe a highly accurate sensing platform using silica nanoparticles/graphene at the surface of aluminum interdigitated electrodes (Al IDE), able to detect trace amounts of arsenic(III) in rice grain samples. The morphology and electrical properties of fabricated Al IDEs were characterized and standardized using AFM, and SEM with EDX analyses. Micrometer scale Al IDEs were fabricated with silicon, aluminum, and oxygen as primary elements. Validation of the bare Al IDE with electrolyte fouling was performed at different pH levels. The sensing surface was stable with no electrolyte fouling at pH 7. Each chemical modification step was monitored with current-volt measurement. The surface chemical bonds were characterized by fourier transform infrared spectroscopy (FTIR) and revealed different peaks when interacting with arsenic (1600-1000 cm). Both silica nanoparticles and graphene presented a sensitive limit of detection as measured by slope calibration curves at 0.0000001 pg/ml, respectively. Further, linear regression was established using ΔI (A) = 3.86 E log (Arsenic concentration) [g/ml] + 8.67 E [A] for silica nanoparticles, whereas for graphene Y = 3.73 E (Arsenic concentration) [g/ml] + 8.52 E on the linear range of 0.0000001 pg/ml to 0.01 pg/ml. The R for silica (0.96) and that of graphene (0.94) was close to the maximum (1). Modification with silica nanoparticles was highly stable. The potential use of silica nanoparticles in the detection of arsenic in rice grain extract can be attributed to their size and stability.
砷是对生态系统的一个主要的全球性威胁。在这里,我们描述了一个使用硅纳米粒子/石墨烯在铝叉指电极(Al IDE)表面的高度精确的传感平台,能够检测大米样品中的痕量砷(III)。使用原子力显微镜(AFM)和扫描电子显微镜(SEM)与 EDX 分析对所制备的 Al IDE 的形貌和电学性能进行了表征和标准化。以硅、铝和氧为主要元素制备了微米级的 Al IDE。在不同的 pH 值下,对带有电解质污垢的裸 Al IDE 进行了验证。在 pH 值为 7 时,传感表面稳定,没有电解质污垢。每个化学修饰步骤都通过电流-电压测量进行监测。通过傅里叶变换红外光谱(FTIR)对表面化学键进行了表征,当与砷相互作用时显示出不同的峰值(1600-1000 cm)。通过斜率校准曲线测量,硅纳米粒子和石墨烯的检测限均分别为 0.0000001 pg/ml,呈现出较高的灵敏度。此外,通过建立线性回归方程,硅纳米粒子的线性回归方程为 ΔI (A) = 3.86 E log(砷浓度)[g/ml] + 8.67 E [A],而石墨烯的线性回归方程为 Y = 3.73 E(砷浓度)[g/ml] + 8.52 E,线性范围为 0.0000001 pg/ml 至 0.01 pg/ml。硅纳米粒子的 R 值(0.96)和石墨烯的 R 值(0.94)接近最大值(1)。硅纳米粒子的修饰具有高度的稳定性。硅纳米粒子在大米提取物中检测砷的潜在用途可归因于其尺寸和稳定性。