Liang Chih-Hao, Chen Ying-Jung
R&D Division, Walsin Technology Corporation, Kaohsiung 806, Taiwan.
Department of Fragrance and Cosmetic Science, Kaohsiung Medical University, Kaohsiung 807, Taiwan.
Nanomaterials (Basel). 2021 Jul 29;11(8):1954. doi: 10.3390/nano11081954.
A series of metal-free UV/near infrared (NIR)-shielding coatings are successfully fabricated by shielded cathodic arc plasma evaporation (CAPE) and substrate-biased RF magnetron sputtering processes. The UV/NIR-shielding coatings comprising quarter-wave stacks of TiO/SiO multilayers and high-conductivity sputter-deposited ITO films with a thickness in the range of 200-600 nm could block IRA and IRB radiations, respectively. The total thicknesses of UV/near infrared-shielding films are in the range from 375 nm to 1513.8 nm. The anatase-phase TiO films with absorption edge located at ∼375 nm were deposited by shielded CAPE at ∼100 °C. Further, the well-crystallized ITO films were found to have high free-electron concentrations (1.12 × 10 cm), resulting in strong absorption of IRB due to the plasmon resonance absorption. The optimal optical design and ITO film thickness were investigated, and the TiO(SiO/TiO) multilayer combined with an ITO film thickness of 400 nm was found to provide a high NIR-shielding rate of 94.8%, UVB to UVA-shielding rate of 92.7%, and average visible light transmittance of 68.1%. Further, human skin cells protected by a UV/NIR-shielding coating showed significantly decreased reactive oxygen species generation and inflammatory cytokine expression as compared to those of unprotected cells. The results demonstrate that the development of multifunction coatings have potential for transparent heat insulation windows and human skin protection against UV/IR radiations.
通过屏蔽阴极电弧等离子体蒸发（CAPE）和衬底偏置射频磁控溅射工艺，成功制备了一系列无金属的紫外/近红外（NIR）屏蔽涂层。由TiO/SiO多层膜的四分之一波长堆叠和厚度在200 - 600 nm范围内的高导电性溅射沉积ITO膜组成的紫外/NIR屏蔽涂层，可分别阻挡IRA和IRB辐射。紫外/近红外屏蔽膜的总厚度在375 nm至1513.8 nm范围内。通过在约100°C下的屏蔽CAPE沉积了吸收边缘位于约375 nm的锐钛矿相TiO膜。此外，发现结晶良好的ITO膜具有高自由电子浓度（1.12×10 cm），由于等离子体共振吸收导致对IRB有强烈吸收。研究了最佳光学设计和ITO膜厚度，发现TiO(SiO/TiO)多层膜与400 nm厚的ITO膜相结合，可提供94.8%的高NIR屏蔽率、92.7%的UVB到UVA屏蔽率以及68.1%的平均可见光透过率。此外，与未受保护的细胞相比，受紫外/NIR屏蔽涂层保护的人体皮肤细胞显示出活性氧生成和炎性细胞因子表达显著降低。结果表明，多功能涂层的开发在透明隔热窗和人体皮肤免受紫外/红外辐射保护方面具有潜力。
