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用于范德华层状材料的铟接触范德华间隙隧穿光谱学。

Indium-contacted van der Waals gap tunneling spectroscopy for van der Waals layered materials.

作者信息

Choi Dong-Hwan, Min Kyung-Ah, Hong Suklyun, Kim Bum-Kyu, Bae Myung-Ho, Kim Ju-Jin

机构信息

Department of Physics, Jeonbuk National University, Jeonju, 54896, Republic of Korea.

Korea Research Institute of Standards and Science, Daejeon, 34113, Republic of Korea.

出版信息

Sci Rep. 2021 Sep 7;11(1):17790. doi: 10.1038/s41598-021-97110-z.

Abstract

The electrical phase transition in van der Waals (vdW) layered materials such as transition-metal dichalcogenides and BiSrCaCuO (Bi-2212) high-temperature superconductor has been explored using various techniques, including scanning tunneling and photoemission spectroscopies, and measurements of electrical resistance as a function of temperature. In this study, we develop one useful method to elucidate the electrical phases in vdW layered materials: indium (In)-contacted vdW tunneling spectroscopy for 1T-TaS, Bi-2212 and 2H-MoS. We utilized the vdW gap formed at an In/vdW material interface as a tunnel barrier for tunneling spectroscopy. For strongly correlated electron systems such as 1T-TaS and Bi-2212, pronounced gap features corresponding to the Mott and superconducting gaps were respectively observed at T = 4 K. We observed a gate dependence of the amplitude of the superconducting gap, which has potential applications in a gate-tunable superconducting device with a SiO/Si substrate. For In/10 nm-thick 2H-MoS devices, differential conductance shoulders at bias voltages of approximately ± 0.45 V were observed, which were attributed to the semiconducting gap. These results show that In-contacted vdW gap tunneling spectroscopy in a fashion of field-effect transistor provides feasible and reliable ways to investigate electronic structures of vdW materials.

摘要

人们已经使用各种技术来探索范德华(vdW)层状材料中的电相变,这些材料包括过渡金属二卤化物和BiSrCaCuO(Bi-2212)高温超导体,所使用的技术有扫描隧道光谱和光电子能谱,以及测量电阻随温度的变化。在本研究中,我们开发了一种用于阐明vdW层状材料中电相的有用方法:用于1T-TaS、Bi-2212和2H-MoS的铟(In)接触vdW隧道光谱。我们利用在In/vdW材料界面处形成的vdW能隙作为隧道光谱的隧道势垒。对于1T-TaS和Bi-2212等强关联电子系统,在T = 4 K时分别观察到了对应于莫特能隙和超导能隙的明显能隙特征。我们观察到超导能隙幅度的栅极依赖性,这在具有SiO/Si衬底的栅极可调超导器件中具有潜在应用。对于In/10 nm厚的2H-MoS器件,在约±0.45 V的偏置电压下观察到了微分电导肩峰,这归因于半导体能隙。这些结果表明,以场效应晶体管的方式进行In接触vdW能隙隧道光谱为研究vdW材料的电子结构提供了可行且可靠的方法。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f424/8423830/b1020d048ded/41598_2021_97110_Fig1_HTML.jpg

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