González Ana Silvia, Vega Víctor, Cuevas Ana Laura, Yuso María Del Valle Martínez de, Prida Víctor M, Benavente Juana
Departamento de Física, Facultad de Ciencias, Universidad de Oviedo, E-33007 Oviedo, Spain.
Laboratorio de Membranas Nanoporosas, Servicios Científico-Técnicos, Universidad de Oviedo, E-33006 Oviedo, Spain.
Materials (Basel). 2021 Sep 3;14(17):5052. doi: 10.3390/ma14175052.
Changes associated to atomic layer deposition (ALD) of SiO from 3-aminopropyl triethoxysilane (APTES) and O, on a nanoporous alumina structure, obtained by two-step electrochemical anodization in oxalic acid electrolyte (Ox sample) are analysed. A reduction of 16% in pore size for the Ox sample, used as support, was determined by SEM analysis after its coverage by a SiO layer (Ox+SiO sample), independently of APTES or O modification (Ox+SiO/APTES and Ox+SiO/APTES/O samples). Chemical surface modification was determined by X-ray photoelectron spectroscopy (XPS) technique during the different stages of the ALD process, and differences induced at the surface level on the Ox nanoporous alumina substrate seem to affect interfacial effects of both samples when they are in contact with an electrolyte solution according to electrochemical impedance spectroscopy (EIS) measurements, or their refraction index as determined by spectroscopic ellipsometry (SE) technique. However, no substantial differences in properties related to the nanoporous structure of anodic alumina (photoluminescent (PL) character or geometrical parameters) were observed between Ox+SiO/APTES and Ox+SiO/APTES/O samples.
分析了通过在草酸电解液中两步电化学阳极氧化法制备的纳米多孔氧化铝结构（Ox样品）上，由3-氨丙基三乙氧基硅烷（APTES）和O进行原子层沉积（ALD）SiO所带来的变化。作为载体的Ox样品在被SiO层覆盖后（Ox+SiO样品），通过扫描电子显微镜（SEM）分析确定其孔径减小了16%，这与APTES或O的改性无关（Ox+SiO/APTES和Ox+SiO/APTES/O样品）。在ALD过程的不同阶段，通过X射线光电子能谱（XPS）技术确定了化学表面改性，并且根据电化学阻抗谱（EIS）测量，当Ox纳米多孔氧化铝基底与电解液接触时，表面水平上诱导的差异似乎会影响两个样品的界面效应，或者根据光谱椭偏仪（SE）技术确定的它们的折射率。然而，在Ox+SiO/APTES和Ox+SiO/APTES/O样品之间，未观察到与阳极氧化铝纳米多孔结构相关的性质（光致发光（PL）特性或几何参数）有实质性差异。
