Martínez Alba, González-Lana Sandra, Asín Laura, de la Fuente Jesús M, Bastiaansen Cees W M, Broer Dirk J, Sánchez-Somolinos Carlos
Instituto de Nanociencia y Materiales de Aragón (INMA), CSIC-Universidad de Zaragoza, Advanced Manufacturing Laboratory, Departamento de Física de la Materia Condensada, C./Pedro Cerbuna 12, 50009 Zaragoza, Spain.
BEONCHIP S.L., CEMINEM, Campus Rio Ebro. C./Mariano Esquillor Gómez s/n, 50018 Zaragoza, Spain.
Polymers (Basel). 2021 Aug 31;13(17):2958. doi: 10.3390/polym13172958.
Photoembossing is a powerful photolithographic technique to prepare surface relief structures relying on polymerization-induced diffusion in a solventless development step. Conveniently, surface patterns are formed by two or more interfering laser beams without the need for a lithographic mask. The use of nanosecond pulsed light-based interference lithography strengthens the pattern resolution through the absence of vibrational line pattern distortions. Typically, a conventional photoembossing protocol consists of an exposure step at room temperature that is followed by a thermal development step at high temperature. In this work, we explore the possibility to perform the pulsed holographic exposure directly at the development temperature. The surface relief structures generated using this modified photoembossing protocol are compared with those generated using the conventional one. Importantly, the enhancement of surface relief height has been observed by exposing the samples directly at the development temperature, reaching approximately double relief heights when compared to samples obtained using the conventional protocol. Advantageously, the light dose needed to reach the optimum height and the amount of photoinitiator can be substantially reduced in this modified protocol, demonstrating it to be a more efficient process for surface relief generation in photopolymers. Kidney epithelial cell alignment studies on substrates with relief-height optimized structures generated using the two described protocols demonstrate improved cell alignment in samples generated with exposure directly at the development temperature, highlighting the relevance of the height enhancement reached by this method. Although cell alignment is well-known to be enhanced by increasing the relief height of the polymeric grating, our work demonstrates nano-second laser interference photoembossing as a powerful tool to easily prepare polymeric gratings with tunable topography in the range of interest for fundamental cell alignment studies.
光压印是一种强大的光刻技术,用于制备表面浮雕结构,该技术在无溶剂显影步骤中依赖于聚合诱导扩散。方便的是,表面图案由两束或多束干涉激光束形成,无需光刻掩膜。基于纳秒脉冲光的干涉光刻技术通过消除振动线图案畸变来提高图案分辨率。通常,传统的光压印方案包括在室温下的曝光步骤,随后是在高温下的热显影步骤。在这项工作中,我们探索了在显影温度下直接进行脉冲全息曝光的可能性。将使用这种改进的光压印方案生成的表面浮雕结构与使用传统方案生成的结构进行了比较。重要的是,通过在显影温度下直接曝光样品,观察到表面浮雕高度有所增加,与使用传统方案获得的样品相比,浮雕高度达到了约两倍。有利的是,在这种改进的方案中,可以大幅减少达到最佳高度所需的光剂量和光引发剂的用量,这表明它是一种在光聚合物中生成表面浮雕更有效的方法。对使用上述两种方案生成的具有优化浮雕高度结构的基底进行肾上皮细胞排列研究表明,在直接在显影温度下曝光生成的样品中细胞排列得到改善,突出了该方法实现的高度增加的相关性。尽管众所周知,通过增加聚合物光栅的浮雕高度可以增强细胞排列,但我们的工作表明,纳秒激光干涉光压印是一种强大的工具,可以轻松制备具有可调形貌的聚合物光栅,适用于基础细胞排列研究的感兴趣范围。