基于专利资源分析1990 - 2010年半导体行业工人接触苯的可能性
Possibility of Benzene Exposure in Workers of a Semiconductor Industry Based on the Patent Resources, 1990-2010.
作者信息
Choi Sangjun, Park Donguk, Park Yunkyung
机构信息
Department of Preventive Medicine, College of Medicine, The Catholic University of Korea, Seoul, 06591, Republic of Korea.
Department of Environmental Health, Korea National Open University, Seoul, 03087, Republic of Korea.
出版信息
Saf Health Work. 2021 Sep;12(3):403-415. doi: 10.1016/j.shaw.2021.01.011. Epub 2021 Feb 10.
BACKGROUND
This study aimed to assess the possibility of benzene exposure in workers of a Korean semiconductor manufacturing company by reviewing the issued patents.
METHODS
A systematic patent search was conducted with the Google "Advanced Patent Search" engine using the keywords "semiconductor" and "benzene" combined with all of the words accessed on January 24, 2016.
RESULTS
As a result of the search, we reviewed 75 patent documents filed by a Korean semiconductor manufacturing company from 1994 to 2010. From 22 patents, we found that benzene could have been used as one of the carbon sources in chemical vapor deposition for capacitor; as diamond-like carbon for solar cell, graphene formation, or etching for transition metal thin film; and as a solvent for dielectric film, silicon oxide layer, nanomaterials, photoresist, rise for immersion lithography, electrophotography, and quantum dot ink.
CONCLUSION
Considering the date of patent filing, it is possible that workers in the chemical vapor deposition, immersion lithography, and graphene formation processes could be exposed to benzene from 1996 to 2010.
背景
本研究旨在通过审查已发布的专利来评估一家韩国半导体制造公司的工人接触苯的可能性。
方法
使用谷歌“高级专利搜索”引擎，结合2016年1月24日访问的所有词汇，以“半导体”和“苯”为关键词进行系统的专利检索。
结果
检索结果显示，我们审查了一家韩国半导体制造公司在1994年至2010年期间提交的75份专利文件。从22份专利中，我们发现苯可能被用作电容器化学气相沉积中的碳源之一；用于太阳能电池的类金刚石碳、石墨烯形成或过渡金属薄膜蚀刻；以及用作介电膜、氧化硅层、纳米材料、光刻胶、浸没光刻显影液、电子照相和量子点墨水的溶剂。
结论
考虑到专利申请日期，1996年至2010年期间，化学气相沉积、浸没光刻和石墨烯形成工艺的工人有可能接触到苯。
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