Ausloos P, Rebbert R E, Glasgow L
Institute for Materials Research, National Bureau of Standards, Washington, DC 20234.
J Res Natl Bur Stand (1977). 1977 Jul-Aug;82(1):1-8. doi: 10.6028/jres.082.001.
Irradiation of CCl, CFCl, and CFCl in the presence of CH in vessels containing silica sand or fused quartz tubing results in the formation of chlorine-containing products. The formation of these compounds occurs at wavelengths extending up to approximately 400 nm, that is, at wavelengths well beyond the absorption threshold of the chloromethanes in the gas phase. It is suggested that CCl adsorbed on silica surfaces photodissociates to yield CCl and CCl species. The poor material balance obtained in these experiments indicates that several of the chlorine-containing fragments are strongly adsorbed on the surface. At a CCl pressure of 13 Pa (0.1 torr), photolysis with 366 nm light in the presence of sand results in the decomposition of one molecule for every 10 photons striking the surface. Under otherwise identical conditions, the photon-induced breakdown of CFCl and CFCl is respectively only 10 percent or 3 percent as efficient.
在含有硅砂或熔融石英管的容器中，在CH存在的情况下对CCl、CFCl和CFCl进行辐照，会导致含氯产物的形成。这些化合物的形成发生在波长延伸至约400nm的范围内，也就是说，在远高于氯甲烷气相吸收阈值的波长下。有人认为，吸附在二氧化硅表面的CCl光解会产生CCl和CCl物种。这些实验中获得的物料平衡较差，表明一些含氯碎片被强烈吸附在表面。在CCl压力为13Pa（0.1托）时，在沙子存在下用366nm光进行光解，每10个撞击表面的光子会导致一个分子分解。在其他条件相同的情况下，CFCl和CFCl的光子诱导分解效率分别仅为10%或3%。
