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在碳膜上简单制备固态纳米孔

Simple Fabrication of Solid-State Nanopores on a Carbon Film.

作者信息

Takai Natsumi, Shoji Kan, Maki Tei, Kawano Ryuji

机构信息

Department of Biotechnology and Life Science, Tokyo University of Agriculture and Technology, Tokyo 184-8588, Japan.

Department of Mechanical Engineering, Nagaoka University of Technology, Niigata 940-2188, Japan.

出版信息

Micromachines (Basel). 2021 Sep 21;12(9):1135. doi: 10.3390/mi12091135.

Abstract

Solid-state nanopores are widely used as a platform for stochastic nanopore sensing because they can provide better robustness, controllable pore size, and higher integrability than biological nanopores. However, the fabrication procedures, including thin film preparation and nanopore formation, require advanced micro-and nano-fabrication techniques. Here, we describe the simple fabrication of solid-state nanopores in a commercially available material: a flat thin carbon film-coated micro-grid for a transmission electron microscope (TEM). We attempted two general methods for nanopore fabrication in the carbon film. The first method was a scanning TEM (STEM) electron beam method. Nanopores were fabricated by irradiating a focused electron beam on the carbon membrane on micro-grids, resulting in the production of nanopores with pore diameters ranging from 2 to 135 nm. The second attempt was a dielectric breakdown method. In this method, nanopores were fabricated by applying a transmembrane voltage of 10 or 30 V through the carbon film on micro-grids. As a result, nanopores with pore diameters ranging from 3.7 to 1345 nm were obtained. Since these nanopores were successfully fabricated in the commercially available carbon thin film using readily available devices, we believe that these solid-state nanopores offer great utility in the field of nanopore research.

摘要

固态纳米孔作为一种用于随机纳米孔传感的平台被广泛应用,因为与生物纳米孔相比,它们能提供更好的稳健性、可控的孔径以及更高的集成度。然而,其制造过程,包括薄膜制备和纳米孔形成,需要先进的微纳制造技术。在此,我们描述了在一种市售材料中简单制造固态纳米孔的方法:一种用于透射电子显微镜(TEM)的涂覆有扁平碳薄膜的微栅格。我们尝试了两种在碳膜中制造纳米孔的常规方法。第一种方法是扫描透射电子显微镜(STEM)电子束法。通过将聚焦电子束照射在微栅格上的碳膜上制造纳米孔,从而产生孔径范围为2至135纳米的纳米孔。第二次尝试是介电击穿法。在这种方法中,通过在微栅格上的碳膜施加10或30伏的跨膜电压来制造纳米孔。结果,获得了孔径范围为3.7至1345纳米的纳米孔。由于这些纳米孔是使用现成的设备在市售碳薄膜中成功制造的,我们相信这些固态纳米孔在纳米孔研究领域具有很大的实用性。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/4055/8469253/07f01a160e21/micromachines-12-01135-g001.jpg

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