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基于MXene和MN(M = Al,Ga)的原子尺度异质结构的电子和光学性质:一项密度泛函理论研究

Electronic and Optical Properties of Atomic-Scale Heterostructure Based on MXene and MN (M = Al, Ga): A DFT Investigation.

作者信息

Ren Kai, Zheng Ruxin, Xu Peng, Cheng Dong, Huo Wenyi, Yu Jin, Zhang Zhuoran, Sun Qingyun

机构信息

School of Mechanical and Electronic Engineering, Nanjing Forestry University, Nanjing 210037, China.

School of Materials Science and Engineering, Southeast University, Nanjing 211189, China.

出版信息

Nanomaterials (Basel). 2021 Aug 30;11(9):2236. doi: 10.3390/nano11092236.

Abstract

After the discovery of graphene, a lot of research has been conducted on two-dimensional (2D) materials. In order to increase the performance of 2D materials and expand their applications, two different layered materials are usually combined by van der Waals (vdW) interactions to form a heterostructure. In this work, based on first-principles calculation, some charming properties of the heterostructure constructed by HfCO, AlN and GaN are addressed. The results show that HfCO/AlN and HfCO/GaN vdW heterostructures can keep their original band structure shape and have strong thermal stability at 300 K. In addition, the HfCO/MN heterostructure has I-type band alignment structure, which can be used as a promising light-emitting device material. The charge transfer between the HfCO and AlN (or GaN) monolayers is 0.1513 (or 0.0414) ||. The potential of HfCO/AlN and HfCO/GaN vdW heterostructures decreases by 6.445 eV and 3.752 eV, respectively, across the interface. Furthermore, both HfCO/AlN and HfCO/GaN heterostructures have remarkable optical absorption capacity, which further shows the application prospect of the HfCO/MN heterostructure. The study of this work provides theoretical guidance for the design of heterostructures for use as photocatalytic and photovoltaic devices.

摘要

在石墨烯被发现之后,人们对二维(2D)材料进行了大量研究。为了提高二维材料的性能并拓展其应用,通常通过范德华(vdW)相互作用将两种不同的层状材料结合起来形成异质结构。在这项工作中,基于第一性原理计算,研究了由HfCO、AlN和GaN构建的异质结构的一些迷人特性。结果表明,HfCO/AlN和HfCO/GaN范德华异质结构能够保持其原始能带结构形状,并且在300 K时具有很强的热稳定性。此外,HfCO/MN异质结构具有I型能带排列结构,可作为一种很有前景的发光器件材料。HfCO与AlN(或GaN)单层之间的电荷转移为0.1513(或0.0414)||。HfCO/AlN和HfCO/GaN范德华异质结构的电势在界面处分别降低了6.445 eV和3.752 eV。此外,HfCO/AlN和HfCO/GaN异质结构都具有显著的光吸收能力,这进一步展示了HfCO/MN异质结构的应用前景。这项工作的研究为用作光催化和光伏器件的异质结构设计提供了理论指导。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/c467/8467826/be5b1795349a/nanomaterials-11-02236-g001.jpg

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