Suppr超能文献

外延应变ZrO薄膜中的无唤醒铁电菱面体相

Wake-up Free Ferroelectric Rhombohedral Phase in Epitaxially Strained ZrO Thin Films.

作者信息

Silva José P B, Negrea Raluca F, Istrate Marian C, Dutta Sangita, Aramberri Hugo, Íñiguez Jorge, Figueiras Fábio G, Ghica Corneliu, Sekhar Koppole C, Kholkin Andrei L

机构信息

Centre of Physics of Minho and Porto Universities (CF-UM-UP), Campus de Gualtar, Braga 4710-057, Portugal.

National Institute of Materials Physics, 105 bisAtomistilor, Magurele 077125, Romania.

出版信息

ACS Appl Mater Interfaces. 2021 Nov 3;13(43):51383-51392. doi: 10.1021/acsami.1c15875. Epub 2021 Oct 25.

Abstract

Zirconia- and hafnia-based thin films have attracted tremendous attention in the past decade because of their unexpected ferroelectric behavior at the nanoscale, which enables the downscaling of ferroelectric devices. The present work reports an unprecedented ferroelectric rhombohedral phase of ZrO that can be achieved in thin films grown directly on (111)-Nb:SrTiO substrates by ion-beam sputtering. Structural and ferroelectric characterizations reveal (111)-oriented ZrO films under epitaxial compressive strain exhibiting switchable ferroelectric polarization of about 20.2 μC/cm with a coercive field of 1.5 MV/cm. Moreover, the time-dependent polarization reversal characteristics of Nb:SrTiO/ZrO/Au film capacitors exhibit typical bell-shaped curve features associated with the ferroelectric domain reversal and agree well with the nucleation limited switching (NLS) model. The polarization-electric field hysteresis loops point to an activation field comparable to the coercive field. Interestingly, the studied films show ferroelectric behavior per se, without the need to apply the wake-up cycle found in the orthorhombic phase of ZrO. Overall, the rhombohedral ferroelectric ZrO films present technological advantages over the previously studied zirconia- and hafnia-based thin films and may be attractive for nanoscale ferroelectric devices.

摘要

在过去十年中,基于氧化锆和氧化铪的薄膜因其在纳米尺度上出人意料的铁电行为而备受关注,这种行为使得铁电器件能够实现小型化。目前的工作报道了一种前所未有的氧化锆铁电菱方相,它可以通过离子束溅射直接在(111)-铌掺杂钛酸锶(Nb:SrTiO)衬底上生长的薄膜中实现。结构和铁电特性表征表明,在(111)取向的氧化锆薄膜中,外延压缩应变下呈现出约20.2 μC/cm²的可切换铁电极化,矫顽场为1.5 MV/cm。此外,铌掺杂钛酸锶/氧化锆/金薄膜电容器的时间相关极化反转特性呈现出与铁电畴反转相关的典型钟形曲线特征,并且与成核限制开关(NLS)模型吻合良好。极化-电场滞后回线表明激活场与矫顽场相当。有趣的是,所研究的薄膜本身就表现出铁电行为,无需应用在氧化锆正交相中发现的唤醒循环。总体而言,菱方铁电氧化锆薄膜相对于先前研究的基于氧化锆和氧化铪的薄膜具有技术优势,可能对纳米级铁电器件具有吸引力。

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验