Jayakrishnan Ampattu R, Kim Ji S, Hellenbrand Markus, Marques Luís S, MacManus-Driscoll Judith L, Silva José P B
Physics Center of Minho and Porto Universities (CF-UM-UP), University of Minho, Campus de Gualtar, 4710-057 Braga, Portugal.
Laboratory of Physics for Materials and Emergent Technologies, LapMET, University of Minho, 4710-057 Braga, Portugal.
Mater Horiz. 2024 May 20;11(10):2355-2371. doi: 10.1039/d4mh00153b.
Ferroelectric memory devices such as ferroelectric memristors, ferroelectric tunnel junctions, and field-effect transistors are considered among the most promising candidates for neuromorphic computing devices. The promise arises from their defect-independent switching mechanism, low energy consumption and high power efficiency, and important properties being aimed for are reliable switching at high speed, excellent endurance, retention, and compatibility with complementary metal-oxide-semiconductor (CMOS) technology. Binary or doped binary materials have emerged over conventional complex-composition ferroelectrics as an optimum solution, particularly in terms of CMOS compatibility. The current state-of-the-art route to achieving superlative ferroelectric performance of binary oxides is to induce ferroelectricity at the nanoscale, , in ultra-thin films of doped HfO, ZrO, ZnMgO, AScN, and BiSmO. This short review article focuses on the materials science of emerging new ferroelectric materials, including their different properties such as remanent polarization, coercive field, endurance, The potential of these materials is discussed for neuromorphic applications.
铁电忆阻器、铁电隧道结和场效应晶体管等铁电存储器件被认为是神经形态计算设备最有前途的候选者之一。其前景源于它们与缺陷无关的开关机制、低能耗和高功率效率,以及旨在实现的重要特性,即高速可靠开关、优异的耐久性、保持性以及与互补金属氧化物半导体(CMOS)技术的兼容性。二元或掺杂二元材料已超越传统的复杂成分铁电体,成为一种最佳解决方案,特别是在CMOS兼容性方面。实现二元氧化物卓越铁电性能的当前最先进途径是在纳米尺度上诱导铁电性,即在掺杂的HfO、ZrO、ZnMgO、AScN和BiSmO的超薄膜中诱导铁电性。这篇简短的综述文章重点关注新兴铁电材料的材料科学,包括它们的不同特性,如剩余极化、矫顽场、耐久性等,并讨论了这些材料在神经形态应用中的潜力。