Kim Youngchan, Jeong Euihoon, Joe Minwoong, Lee Changgu
School of Mechanical and Automotive Engineering, Kyungsung University, 309, Suyeong-ro, Nam-gu, Busan, Republic of Korea.
SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Seobu-ro, Jangan-gu, Suwon, Gyeonggi-do, 2066, Republic of Korea.
Phys Chem Chem Phys. 2021 Dec 8;23(47):26806-26812. doi: 10.1039/d1cp03815j.
2-Dimensional (2D) semiconducting materials are attractive candidates for future electronic device applications due to the tunable bandgap, transparency, flexibility, and downscaling to the atomic level in material size and thickness. However, 2D materials have critical issues regarding van der Waals contact, interface instability and power consumption. In particular, the development of semiconducting electronics based on 2D materials is significantly hindered by a low charge-carrier mobility. In order to improve the critical shortcoming, diverse efforts have been made in synthesis and device engineering. Here, we propose a synthesis method of single crystalline 2D BiS by chemical vapor deposition for high performance electronic device applications. The ion-gel gated field effect transistor with the as-grown BiS on the SiO substrate exhibits a high mobility of 100.4 cm V S and an on-off current ratio of 104 under a low gate voltage below 4 V at room temperature without chemical doping and surface engineering. The superior performance is attributed to the high crystal quality of BiS that shows low sulfur vacancies and atomic ratio close to the ideal value (2 : 3) under a rich sulfur growth process using HS gas instead of sulfur powder. The synthesis method will provide a platform to realize high performance electronics and optoelectronics based on 2D semiconductors.
二维(2D)半导体材料因其可调谐带隙、透明度、柔韧性以及在材料尺寸和厚度上可缩小至原子级别,成为未来电子器件应用的有吸引力的候选材料。然而,二维材料在范德华接触、界面不稳定性和功耗方面存在关键问题。特别是,基于二维材料的半导体电子学发展受到低载流子迁移率的显著阻碍。为了改善这一关键缺点,人们在合成和器件工程方面做出了各种努力。在此,我们提出一种通过化学气相沉积法合成用于高性能电子器件应用的单晶二维BiS的方法。在SiO衬底上生长的BiS制成的离子凝胶栅场效应晶体管在室温下、低于4 V的低栅极电压下,无需化学掺杂和表面工程处理,就展现出100.4 cm² V⁻¹ s⁻¹的高迁移率和10⁴的开-关电流比。这种优异性能归因于BiS的高质量晶体,在使用HS气体而非硫粉的富硫生长过程中,BiS显示出低硫空位且原子比接近理想值(2∶3)。该合成方法将为基于二维半导体实现高性能电子学和光电子学提供一个平台。