Fadil Nor Akmal, Yusof Siti Zahira, Abu Bakar Tuty Asma, Ghazali Habibah, Mat Yajid Muhamad Azizi, Osman Saliza Azlina, Ourdjini Ali
Department of Materials, Manufacturing, and Industrial Engineering, School of Mechanical Engineering, Faculty of Engineering, Universiti Teknologi Malaysia, Johor Bahru 81310, Malaysia.
Department of Mechanical and Manufacturing Technology, Kolej Vokasional Sungai Buloh, Jalan Kuala Selangor, U20, Shah Alam 40160, Malaysia.
Materials (Basel). 2021 Nov 11;14(22):6817. doi: 10.3390/ma14226817.
Since the use of the most stable Pb-based materials in the electronic industry has been banned due to human health concerns, numerous research studies have focused on Pb-free materials such as pure tin and its alloys for electronic applications. Pure tin, however, suffers from tin whiskers' formation, which tends to endanger the efficiency of electronic circuits, and even worse, may cause short circuits to the electronic components. This research aims to investigate the effects of stress on tin whiskers' formation and growth and the mitigation method for the immersion of the tin surface's finish deposited on a copper substrate. The coated surface was subjected to external stress by micro-hardness indenters with a 2N load in order to simulate external stress applied to the coating layer, prior to storage in the humidity chamber with environmental conditions of 30 °C/60% RH up to 52 weeks. A nickel underlayer was deposited between the tin surface finish and copper substrate to mitigate the formation and growth of tin whiskers. FESEM was used to observe the whiskers and EDX was used for measuring the chemical composition of the surface finish, tin whiskers, and oxides formed after a certain period of storage. An image analyzer was used to measure the whiskers' length using the JEDEC Standard (JESD22-A121A). The results showed that the tin whiskers increased directly proportional to the storage time, and they formed and grew longer on the thicker tin coating (2.3 μm) than the thin coating (1.5 μm). This is due to greater internal stress being generated by the thicker intermetallic compounds identified as the CuSn phase, formed on a thicker tin coating. In addition, the formation and growth of CuO flowers on the 1.5 μm-thick tin coating suppressed the growth of tin whiskers. However, the addition of external stress by an indentation on the tin coating surface showed that the tin whiskers' growth discontinued after week 4 in the indented area. Instead, the whiskers that formed were greater and longer at a distance farther from the indented area due to Sn atom migration from a high stress concentration to a lower stress concentration. Nonetheless, the length of the whisker for the indented surface was shorter than the non-indented surface because the whiskers' growth was suppressed by the formation of CuO flowers. On the other hand, a nickel underlayer successfully mitigated the formation of tin whiskers upon the immersion of a tin surface finish.
由于出于对人体健康的担忧,电子行业已禁止使用最稳定的铅基材料,众多研究聚焦于用于电子应用的无铅材料,如纯锡及其合金。然而,纯锡存在锡须形成的问题,这往往会危及电子电路的效率,更糟糕的是,可能导致电子元件短路。本研究旨在探究应力对锡须形成和生长的影响,以及减轻沉积在铜基板上的锡表面涂层浸泡时锡须形成的方法。在将涂覆表面置于温度为30°C/相对湿度60%的湿度箱中储存长达52周之前,通过施加2N载荷的显微硬度压头对其施加外部应力,以模拟施加于涂层的外部应力。在锡表面涂层和铜基板之间沉积一层镍底层,以减轻锡须的形成和生长。使用场发射扫描电子显微镜(FESEM)观察锡须,使用能谱仪(EDX)测量表面涂层、锡须以及储存一定时间后形成的氧化物的化学成分。使用图像分析仪按照JEDEC标准(JESD22 - A121A)测量锡须的长度。结果表明,锡须的增加与储存时间成正比,并且在较厚的锡涂层(2.3μm)上比在薄涂层(1.5μm)上形成和生长得更长。这是因为在较厚的锡涂层上形成了被确定为CuSn相的更厚的金属间化合物,从而产生了更大的内应力。此外,在1.5μm厚的锡涂层上CuO花的形成抑制了锡须的生长。然而,通过在锡涂层表面进行压痕施加外部应力表明,在压痕区域第4周后锡须的生长停止。相反,由于锡原子从高应力浓度区域迁移到低应力浓度区域,在离压痕区域更远的地方形成的锡须更大更长。尽管如此,压痕表面的锡须长度比未压痕表面的短,因为CuO花的形成抑制了锡须的生长。另一方面,镍底层在锡表面涂层浸泡时成功减轻了锡须 的形成。